JPS6066430A - レジストパタ−ンの形成方法 - Google Patents

レジストパタ−ンの形成方法

Info

Publication number
JPS6066430A
JPS6066430A JP58174716A JP17471683A JPS6066430A JP S6066430 A JPS6066430 A JP S6066430A JP 58174716 A JP58174716 A JP 58174716A JP 17471683 A JP17471683 A JP 17471683A JP S6066430 A JPS6066430 A JP S6066430A
Authority
JP
Japan
Prior art keywords
pattern
resist
exposure
ultraviolet rays
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58174716A
Other languages
English (en)
Japanese (ja)
Other versions
JPH041492B2 (enExample
Inventor
Yoshio Yamashita
山下　吉雄
Takaharu Kawazu
河津　隆治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58174716A priority Critical patent/JPS6066430A/ja
Publication of JPS6066430A publication Critical patent/JPS6066430A/ja
Publication of JPH041492B2 publication Critical patent/JPH041492B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/7045—Hybrid exposures, i.e. multiple exposures of the same area using different types of exposure apparatus, e.g. combining projection, proximity, direct write, interferometric, UV, x-ray or particle beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP58174716A 1983-09-21 1983-09-21 レジストパタ−ンの形成方法 Granted JPS6066430A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58174716A JPS6066430A (ja) 1983-09-21 1983-09-21 レジストパタ−ンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58174716A JPS6066430A (ja) 1983-09-21 1983-09-21 レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS6066430A true JPS6066430A (ja) 1985-04-16
JPH041492B2 JPH041492B2 (enExample) 1992-01-13

Family

ID=15983394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58174716A Granted JPS6066430A (ja) 1983-09-21 1983-09-21 レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS6066430A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4889824A (en) * 1987-12-30 1989-12-26 U.S. Philips Corp. Method of manufacture semiconductor device of the hetero-junction bipolar transistor type
JPH0437134A (ja) * 1990-06-01 1992-02-07 Sharp Corp 厚膜メタル配線の形成方法
KR101106041B1 (ko) * 2011-08-18 2012-01-18 주식회사 정우기술 머시닝 센터의 공작물 자동 교환장치

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4889824A (en) * 1987-12-30 1989-12-26 U.S. Philips Corp. Method of manufacture semiconductor device of the hetero-junction bipolar transistor type
JPH0437134A (ja) * 1990-06-01 1992-02-07 Sharp Corp 厚膜メタル配線の形成方法
KR101106041B1 (ko) * 2011-08-18 2012-01-18 주식회사 정우기술 머시닝 센터의 공작물 자동 교환장치

Also Published As

Publication number Publication date
JPH041492B2 (enExample) 1992-01-13

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