JPS6059078A - ドライエツチング装置 - Google Patents

ドライエツチング装置

Info

Publication number
JPS6059078A
JPS6059078A JP16656283A JP16656283A JPS6059078A JP S6059078 A JPS6059078 A JP S6059078A JP 16656283 A JP16656283 A JP 16656283A JP 16656283 A JP16656283 A JP 16656283A JP S6059078 A JPS6059078 A JP S6059078A
Authority
JP
Japan
Prior art keywords
electrode
dry etching
communicate
etching gas
etching apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16656283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6366394B2 (enExample
Inventor
Seiji Sagawa
誠二 寒川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP16656283A priority Critical patent/JPS6059078A/ja
Publication of JPS6059078A publication Critical patent/JPS6059078A/ja
Publication of JPS6366394B2 publication Critical patent/JPS6366394B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP16656283A 1983-09-12 1983-09-12 ドライエツチング装置 Granted JPS6059078A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16656283A JPS6059078A (ja) 1983-09-12 1983-09-12 ドライエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16656283A JPS6059078A (ja) 1983-09-12 1983-09-12 ドライエツチング装置

Publications (2)

Publication Number Publication Date
JPS6059078A true JPS6059078A (ja) 1985-04-05
JPS6366394B2 JPS6366394B2 (enExample) 1988-12-20

Family

ID=15833560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16656283A Granted JPS6059078A (ja) 1983-09-12 1983-09-12 ドライエツチング装置

Country Status (1)

Country Link
JP (1) JPS6059078A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63157422A (ja) * 1986-12-22 1988-06-30 Tokyo Electron Ltd アッシング処理装置
JPH01108930U (enExample) * 1988-01-14 1989-07-24
JPH02184022A (ja) * 1989-01-11 1990-07-18 Koujiyundo Kagaku Kenkyusho:Kk Ｃｖｄ電極
JPH0319318A (ja) * 1989-06-16 1991-01-28 Tokyo Erekutoron Kyushu Kk 被処理体処理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57131372A (en) * 1981-02-05 1982-08-14 Seiko Epson Corp Plasma etching device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57131372A (en) * 1981-02-05 1982-08-14 Seiko Epson Corp Plasma etching device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63157422A (ja) * 1986-12-22 1988-06-30 Tokyo Electron Ltd アッシング処理装置
JPH01108930U (enExample) * 1988-01-14 1989-07-24
JPH02184022A (ja) * 1989-01-11 1990-07-18 Koujiyundo Kagaku Kenkyusho:Kk Ｃｖｄ電極
JPH0319318A (ja) * 1989-06-16 1991-01-28 Tokyo Erekutoron Kyushu Kk 被処理体処理装置

Also Published As

Publication number Publication date
JPS6366394B2 (enExample) 1988-12-20

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