JPS605572A - 高速半導体デバイスの製造方法 - Google Patents
高速半導体デバイスの製造方法Info
- Publication number
- JPS605572A JPS605572A JP58112876A JP11287683A JPS605572A JP S605572 A JPS605572 A JP S605572A JP 58112876 A JP58112876 A JP 58112876A JP 11287683 A JP11287683 A JP 11287683A JP S605572 A JPS605572 A JP S605572A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- grown
- gasb
- inas
- alsb
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/82—Heterojunctions
- H10D62/824—Heterojunctions comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/473—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58112876A JPS605572A (ja) | 1983-06-24 | 1983-06-24 | 高速半導体デバイスの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58112876A JPS605572A (ja) | 1983-06-24 | 1983-06-24 | 高速半導体デバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS605572A true JPS605572A (ja) | 1985-01-12 |
JPH0261150B2 JPH0261150B2 (enrdf_load_stackoverflow) | 1990-12-19 |
Family
ID=14597740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58112876A Granted JPS605572A (ja) | 1983-06-24 | 1983-06-24 | 高速半導体デバイスの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS605572A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02246342A (ja) * | 1989-03-20 | 1990-10-02 | Fujitsu Ltd | 半導体装置 |
US5430310A (en) * | 1991-03-28 | 1995-07-04 | Asahi Kasei Kogyo Kabushiki Kaisha | Field effect transistor |
-
1983
- 1983-06-24 JP JP58112876A patent/JPS605572A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02246342A (ja) * | 1989-03-20 | 1990-10-02 | Fujitsu Ltd | 半導体装置 |
US5430310A (en) * | 1991-03-28 | 1995-07-04 | Asahi Kasei Kogyo Kabushiki Kaisha | Field effect transistor |
Also Published As
Publication number | Publication date |
---|---|
JPH0261150B2 (enrdf_load_stackoverflow) | 1990-12-19 |
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