JPS6052845A - パタ−ン形成材料 - Google Patents
パタ−ン形成材料Info
- Publication number
- JPS6052845A JPS6052845A JP58160259A JP16025983A JPS6052845A JP S6052845 A JPS6052845 A JP S6052845A JP 58160259 A JP58160259 A JP 58160259A JP 16025983 A JP16025983 A JP 16025983A JP S6052845 A JPS6052845 A JP S6052845A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- silyl group
- light
- forming material
- silyl groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 20
- 229920000642 polymer Polymers 0.000 claims abstract description 53
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims abstract description 48
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 150000001450 anions Chemical class 0.000 claims abstract description 4
- 230000005865 ionizing radiation Effects 0.000 claims description 22
- 230000005855 radiation Effects 0.000 abstract description 6
- 150000001768 cations Chemical class 0.000 abstract description 3
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 230000001235 sensitizing effect Effects 0.000 abstract 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 30
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 14
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 10
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- -1 p-vinylphenoxy t-butyldimethylsilane Chemical compound 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 241000894007 species Species 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000004342 Benzoyl peroxide Substances 0.000 description 3
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 3
- 235000019400 benzoyl peroxide Nutrition 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 3
- 238000005292 vacuum distillation Methods 0.000 description 3
- UWRZIZXBOLBCON-UHFFFAOYSA-N 2-phenylethenamine Chemical compound NC=CC1=CC=CC=C1 UWRZIZXBOLBCON-UHFFFAOYSA-N 0.000 description 2
- LBSXSAXOLABXMF-UHFFFAOYSA-N 4-Vinylaniline Chemical compound NC1=CC=C(C=C)C=C1 LBSXSAXOLABXMF-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 150000001989 diazonium salts Chemical class 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- PDZGAEAUKGKKDE-UHFFFAOYSA-N lithium;naphthalene Chemical compound [Li].C1=CC=CC2=CC=CC=C21 PDZGAEAUKGKKDE-UHFFFAOYSA-N 0.000 description 2
- FRIJBUGBVQZNTB-UHFFFAOYSA-M magnesium;ethane;bromide Chemical compound [Mg+2].[Br-].[CH2-]C FRIJBUGBVQZNTB-UHFFFAOYSA-M 0.000 description 2
- 239000002685 polymerization catalyst Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- HHPUADFPUXGYTC-UHFFFAOYSA-N 1,2,3-tribromo-5-methylbenzene;1,2,5-tribromo-3-methylbenzene;1,3,5-tribromo-2-methylbenzene Chemical compound CC1=CC(Br)=C(Br)C(Br)=C1.CC1=CC(Br)=CC(Br)=C1Br.CC1=C(Br)C=C(Br)C=C1Br HHPUADFPUXGYTC-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- IYUOYLLVOZNGKW-UHFFFAOYSA-N 2-azidonaphthalene-1,4-dione Chemical compound C1=CC=C2C(=O)C(N=[N+]=[N-])=CC(=O)C2=C1 IYUOYLLVOZNGKW-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- PTZGBPAXEKEBSB-UHFFFAOYSA-N 3-nitrobenzenediazonium Chemical compound [O-][N+](=O)C1=CC=CC([N+]#N)=C1 PTZGBPAXEKEBSB-UHFFFAOYSA-N 0.000 description 1
- MOXBCYIWIODTKI-UHFFFAOYSA-N 4-(dimethylamino)benzenediazonium Chemical compound CN(C)C1=CC=C([N+]#N)C=C1 MOXBCYIWIODTKI-UHFFFAOYSA-N 0.000 description 1
- UPQQTAIBAVTEGV-UHFFFAOYSA-N 4-bromobenzenediazonium Chemical compound BrC1=CC=C([N+]#N)C=C1 UPQQTAIBAVTEGV-UHFFFAOYSA-N 0.000 description 1
- DBEQHSWUYRYJMT-UHFFFAOYSA-N 4-chlorobenzenediazonium Chemical compound ClC1=CC=C([N+]#N)C=C1 DBEQHSWUYRYJMT-UHFFFAOYSA-N 0.000 description 1
- CFCBFJBLDCNGDH-UHFFFAOYSA-N 4-ethenyl-n,n-bis(trimethylsilyl)aniline Chemical compound C[Si](C)(C)N([Si](C)(C)C)C1=CC=C(C=C)C=C1 CFCBFJBLDCNGDH-UHFFFAOYSA-N 0.000 description 1
- ZKBWJZIFJHLDCA-UHFFFAOYSA-N 4-ethenyl-n-trimethylsilylaniline Chemical compound C[Si](C)(C)NC1=CC=C(C=C)C=C1 ZKBWJZIFJHLDCA-UHFFFAOYSA-N 0.000 description 1
- NDBJTKNWAOXLHS-UHFFFAOYSA-N 4-methoxybenzenediazonium Chemical compound COC1=CC=C([N+]#N)C=C1 NDBJTKNWAOXLHS-UHFFFAOYSA-N 0.000 description 1
- LWYMLCYZEMSNBK-UHFFFAOYSA-N 4-methylbenzenediazonium Chemical compound CC1=CC=C([N+]#N)C=C1 LWYMLCYZEMSNBK-UHFFFAOYSA-N 0.000 description 1
- SEALFYKPBRLOAY-UHFFFAOYSA-N 4-phenylbenzenediazonium Chemical compound C1=CC([N+]#N)=CC=C1C1=CC=CC=C1 SEALFYKPBRLOAY-UHFFFAOYSA-N 0.000 description 1
- XURABDHWIADCPO-UHFFFAOYSA-N 4-prop-2-enylhepta-1,6-diene Chemical compound C=CCC(CC=C)CC=C XURABDHWIADCPO-UHFFFAOYSA-N 0.000 description 1
- QJMYXHKGEGNLED-UHFFFAOYSA-N 5-(2-hydroxyethylamino)-1h-pyrimidine-2,4-dione Chemical compound OCCNC1=CNC(=O)NC1=O QJMYXHKGEGNLED-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229910021630 Antimony pentafluoride Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000007818 Grignard reagent Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 244000089486 Phragmites australis subsp australis Species 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- VBVBHWZYQGJZLR-UHFFFAOYSA-I antimony pentafluoride Chemical group F[Sb](F)(F)(F)F VBVBHWZYQGJZLR-UHFFFAOYSA-I 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- CIZVQWNPBGYCGK-UHFFFAOYSA-N benzenediazonium Chemical compound N#[N+]C1=CC=CC=C1 CIZVQWNPBGYCGK-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229950005228 bromoform Drugs 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- MHDVGSVTJDSBDK-UHFFFAOYSA-N dibenzylether Substances C=1C=CC=CC=1COCC1=CC=CC=C1 MHDVGSVTJDSBDK-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 150000004795 grignard reagents Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- IYYLZMUMLWEPGS-UHFFFAOYSA-N n-methyl-1,1,1-triphenylmethanamine Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(NC)C1=CC=CC=C1 IYYLZMUMLWEPGS-UHFFFAOYSA-N 0.000 description 1
- URXNVXOMQQCBHS-UHFFFAOYSA-N naphthalene;sodium Chemical compound [Na].C1=CC=CC2=CC=CC=C21 URXNVXOMQQCBHS-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58160259A JPS6052845A (ja) | 1983-09-02 | 1983-09-02 | パタ−ン形成材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58160259A JPS6052845A (ja) | 1983-09-02 | 1983-09-02 | パタ−ン形成材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6052845A true JPS6052845A (ja) | 1985-03-26 |
| JPH0344290B2 JPH0344290B2 (enrdf_load_stackoverflow) | 1991-07-05 |
Family
ID=15711135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58160259A Granted JPS6052845A (ja) | 1983-09-02 | 1983-09-02 | パタ−ン形成材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6052845A (enrdf_load_stackoverflow) |
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60121446A (ja) * | 1983-12-06 | 1985-06-28 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS6238451A (ja) * | 1985-08-14 | 1987-02-19 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS6238452A (ja) * | 1985-08-14 | 1987-02-19 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS6240450A (ja) * | 1985-08-19 | 1987-02-21 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS62263190A (ja) * | 1986-05-06 | 1987-11-16 | Teiji Tsuruta | 珪素を含む化合物及びその製造法 |
| JPH03289658A (ja) * | 1990-04-06 | 1991-12-19 | Fuji Photo Film Co Ltd | ポジ画像の形成方法 |
| JPH05249683A (ja) * | 1991-07-17 | 1993-09-28 | Japan Synthetic Rubber Co Ltd | 感放射線性組成物 |
| US5336726A (en) * | 1993-03-11 | 1994-08-09 | Shell Oil Company | Butadiene polymers having terminal silyl groups |
| US5378585A (en) * | 1990-06-25 | 1995-01-03 | Matsushita Electronics Corporation | Resist composition having a siloxane-bond structure |
| US5405911A (en) * | 1992-08-31 | 1995-04-11 | Shell Oil Company | Butadiene polymers having terminal functional groups |
| US5556734A (en) * | 1993-12-24 | 1996-09-17 | Japan Synthetic Rubber Co., Ltd. | Radiation sensitive resin composition comprising copolymer of isopropenylphenol and T-butyl(meth)acrylate |
| WO1999042510A1 (en) * | 1998-02-23 | 1999-08-26 | The B.F. Goodrich Company | Modified polycyclic polymers |
| US6506537B2 (en) | 2000-06-12 | 2003-01-14 | Jsr Corporation | Radiation-sensitive resin composition |
| US6623907B2 (en) | 2000-02-04 | 2003-09-23 | Jsr Corporation | Radiation-sensitive resin composition |
| WO2007060919A1 (ja) | 2005-11-25 | 2007-05-31 | Jsr Corporation | 感放射線性樹脂組成物 |
| US7514205B2 (en) | 2005-03-17 | 2009-04-07 | Jsr Corporation | Composition for forming antireflection film, laminate, and method for forming resist pattern |
| US7709182B2 (en) | 2004-12-03 | 2010-05-04 | Jsr Corporation | Composition for forming antireflection film, layered product, and method of forming resist pattern |
| JP2012013812A (ja) * | 2010-06-29 | 2012-01-19 | Fujifilm Corp | パターン形成方法、化学増幅型レジスト組成物、及び、レジスト膜 |
| JP2013083998A (ja) * | 2012-12-13 | 2013-05-09 | Jsr Corp | 感放射線性樹脂組成物 |
| US9140984B2 (en) | 2009-12-22 | 2015-09-22 | Jsr Corporation | Radiation-sensitive composition |
| KR20150143411A (ko) | 2013-04-17 | 2015-12-23 | 제이에스알 가부시끼가이샤 | 반도체 소자의 제조 방법 및 이온 주입 방법 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5558971A (en) | 1994-09-02 | 1996-09-24 | Wako Pure Chemical Industries, Ltd. | Resist material |
| ATE244904T1 (de) | 1995-12-21 | 2003-07-15 | Wako Pure Chem Ind Ltd | Polymerzusammensetzung und rezistmaterial |
| JP3591672B2 (ja) | 1996-02-05 | 2004-11-24 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5332831A (en) * | 1976-09-08 | 1978-03-28 | Nippon Steel Corp | Surface treatment method of metal |
| JPS55105627A (en) * | 1978-12-29 | 1980-08-13 | Gen Electric | Diaryliodonium salt and hardening composition |
| JPS5849717A (ja) * | 1981-09-18 | 1983-03-24 | Hitachi Ltd | 光又は放射線硬化性ポリオルガノシロキサン組成物 |
| JPS58143338A (ja) * | 1982-02-22 | 1983-08-25 | Toshiba Corp | ホトレジスト組成物 |
-
1983
- 1983-09-02 JP JP58160259A patent/JPS6052845A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5332831A (en) * | 1976-09-08 | 1978-03-28 | Nippon Steel Corp | Surface treatment method of metal |
| JPS55105627A (en) * | 1978-12-29 | 1980-08-13 | Gen Electric | Diaryliodonium salt and hardening composition |
| JPS5849717A (ja) * | 1981-09-18 | 1983-03-24 | Hitachi Ltd | 光又は放射線硬化性ポリオルガノシロキサン組成物 |
| JPS58143338A (ja) * | 1982-02-22 | 1983-08-25 | Toshiba Corp | ホトレジスト組成物 |
Cited By (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60121446A (ja) * | 1983-12-06 | 1985-06-28 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS6238451A (ja) * | 1985-08-14 | 1987-02-19 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS6238452A (ja) * | 1985-08-14 | 1987-02-19 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS6240450A (ja) * | 1985-08-19 | 1987-02-21 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS62263190A (ja) * | 1986-05-06 | 1987-11-16 | Teiji Tsuruta | 珪素を含む化合物及びその製造法 |
| JPH03289658A (ja) * | 1990-04-06 | 1991-12-19 | Fuji Photo Film Co Ltd | ポジ画像の形成方法 |
| US5547808A (en) * | 1990-06-25 | 1996-08-20 | Matsushita Electronics Corporation | Resist composition having a siloxane-bond structure |
| US5554465A (en) * | 1990-06-25 | 1996-09-10 | Matsushita Electronics Corporation | Process for forming a pattern using a resist composition having a siloxane-bond structure |
| US5378585A (en) * | 1990-06-25 | 1995-01-03 | Matsushita Electronics Corporation | Resist composition having a siloxane-bond structure |
| JPH05249683A (ja) * | 1991-07-17 | 1993-09-28 | Japan Synthetic Rubber Co Ltd | 感放射線性組成物 |
| US5405911A (en) * | 1992-08-31 | 1995-04-11 | Shell Oil Company | Butadiene polymers having terminal functional groups |
| USRE39617E1 (en) | 1992-08-31 | 2007-05-08 | Kraton Polymers Us Llc | Butadiene polymers having terminal functional groups |
| US5336726A (en) * | 1993-03-11 | 1994-08-09 | Shell Oil Company | Butadiene polymers having terminal silyl groups |
| US5556734A (en) * | 1993-12-24 | 1996-09-17 | Japan Synthetic Rubber Co., Ltd. | Radiation sensitive resin composition comprising copolymer of isopropenylphenol and T-butyl(meth)acrylate |
| WO1999042510A1 (en) * | 1998-02-23 | 1999-08-26 | The B.F. Goodrich Company | Modified polycyclic polymers |
| CN1315906C (zh) * | 1998-02-23 | 2007-05-16 | 住友电木株式会社 | 改性的多环聚合物 |
| US6623907B2 (en) | 2000-02-04 | 2003-09-23 | Jsr Corporation | Radiation-sensitive resin composition |
| US6506537B2 (en) | 2000-06-12 | 2003-01-14 | Jsr Corporation | Radiation-sensitive resin composition |
| US7709182B2 (en) | 2004-12-03 | 2010-05-04 | Jsr Corporation | Composition for forming antireflection film, layered product, and method of forming resist pattern |
| US7514205B2 (en) | 2005-03-17 | 2009-04-07 | Jsr Corporation | Composition for forming antireflection film, laminate, and method for forming resist pattern |
| WO2007060919A1 (ja) | 2005-11-25 | 2007-05-31 | Jsr Corporation | 感放射線性樹脂組成物 |
| US8206888B2 (en) | 2005-11-25 | 2012-06-26 | Jsr Corporation | Radiation-sensitive resin composition |
| US9140984B2 (en) | 2009-12-22 | 2015-09-22 | Jsr Corporation | Radiation-sensitive composition |
| JP2012013812A (ja) * | 2010-06-29 | 2012-01-19 | Fujifilm Corp | パターン形成方法、化学増幅型レジスト組成物、及び、レジスト膜 |
| JP2013083998A (ja) * | 2012-12-13 | 2013-05-09 | Jsr Corp | 感放射線性樹脂組成物 |
| KR20150143411A (ko) | 2013-04-17 | 2015-12-23 | 제이에스알 가부시끼가이샤 | 반도체 소자의 제조 방법 및 이온 주입 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0344290B2 (enrdf_load_stackoverflow) | 1991-07-05 |
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