JPS6046368A - スパツタリングタ−ゲツト - Google Patents

スパツタリングタ−ゲツト

Info

Publication number
JPS6046368A
JPS6046368A JP15352783A JP15352783A JPS6046368A JP S6046368 A JPS6046368 A JP S6046368A JP 15352783 A JP15352783 A JP 15352783A JP 15352783 A JP15352783 A JP 15352783A JP S6046368 A JPS6046368 A JP S6046368A
Authority
JP
Japan
Prior art keywords
target
substrate
sputtering
film
sputtering target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15352783A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6331550B2 (enrdf_load_stackoverflow
Inventor
Takashi Hasegawa
隆 長谷川
Mihiro Sumiyama
隅山　望洋
Hiroshi Shimada
寛 島田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP15352783A priority Critical patent/JPS6046368A/ja
Publication of JPS6046368A publication Critical patent/JPS6046368A/ja
Publication of JPS6331550B2 publication Critical patent/JPS6331550B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP15352783A 1983-08-23 1983-08-23 スパツタリングタ−ゲツト Granted JPS6046368A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15352783A JPS6046368A (ja) 1983-08-23 1983-08-23 スパツタリングタ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15352783A JPS6046368A (ja) 1983-08-23 1983-08-23 スパツタリングタ−ゲツト

Publications (2)

Publication Number Publication Date
JPS6046368A true JPS6046368A (ja) 1985-03-13
JPS6331550B2 JPS6331550B2 (enrdf_load_stackoverflow) 1988-06-24

Family

ID=15564471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15352783A Granted JPS6046368A (ja) 1983-08-23 1983-08-23 スパツタリングタ−ゲツト

Country Status (1)

Country Link
JP (1) JPS6046368A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07183219A (ja) * 1993-10-08 1995-07-21 Varian Assoc Inc プラズマからのイオン抽出を採用するｐｖｄ装置
JP2008239151A (ja) * 2005-12-13 2008-10-09 Shimano Inc 自転車用ブレーキレバー装置用液圧装置。
JP2018115356A (ja) * 2017-01-17 2018-07-26 神港精機株式会社 マグネトロンスパッタ法による反応膜の形成装置および形成方法
JP2018119185A (ja) * 2017-01-26 2018-08-02 神港精機株式会社 マグネトロンスパッタ法による装飾被膜の形成方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207174A (en) * 1981-06-12 1982-12-18 Matsushita Electric Works Ltd Sputtering device
JPS5861461A (ja) * 1981-10-09 1983-04-12 Taihei Kogyo Kk 磁粉探傷における磁粉液散布方法
JPS5861461U (ja) * 1981-10-19 1983-04-25 富士通株式会社 スパツタリング装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207174A (en) * 1981-06-12 1982-12-18 Matsushita Electric Works Ltd Sputtering device
JPS5861461A (ja) * 1981-10-09 1983-04-12 Taihei Kogyo Kk 磁粉探傷における磁粉液散布方法
JPS5861461U (ja) * 1981-10-19 1983-04-25 富士通株式会社 スパツタリング装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07183219A (ja) * 1993-10-08 1995-07-21 Varian Assoc Inc プラズマからのイオン抽出を採用するｐｖｄ装置
JP2008239151A (ja) * 2005-12-13 2008-10-09 Shimano Inc 自転車用ブレーキレバー装置用液圧装置。
JP2018115356A (ja) * 2017-01-17 2018-07-26 神港精機株式会社 マグネトロンスパッタ法による反応膜の形成装置および形成方法
JP2018119185A (ja) * 2017-01-26 2018-08-02 神港精機株式会社 マグネトロンスパッタ法による装飾被膜の形成方法

Also Published As

Publication number Publication date
JPS6331550B2 (enrdf_load_stackoverflow) 1988-06-24

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