JPS6043488A - 薄膜製造装置 - Google Patents

薄膜製造装置

Info

Publication number
JPS6043488A
JPS6043488A JP15148783A JP15148783A JPS6043488A JP S6043488 A JPS6043488 A JP S6043488A JP 15148783 A JP15148783 A JP 15148783A JP 15148783 A JP15148783 A JP 15148783A JP S6043488 A JPS6043488 A JP S6043488A
Authority
JP
Japan
Prior art keywords
thin film
electrode
base body
base
deposition chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15148783A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6153431B2 (enrdf_load_stackoverflow
Inventor
Yukio Suzuki
幸夫 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP15148783A priority Critical patent/JPS6043488A/ja
Publication of JPS6043488A publication Critical patent/JPS6043488A/ja
Publication of JPS6153431B2 publication Critical patent/JPS6153431B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5093—Coaxial electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP15148783A 1983-08-22 1983-08-22 薄膜製造装置 Granted JPS6043488A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15148783A JPS6043488A (ja) 1983-08-22 1983-08-22 薄膜製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15148783A JPS6043488A (ja) 1983-08-22 1983-08-22 薄膜製造装置

Publications (2)

Publication Number Publication Date
JPS6043488A true JPS6043488A (ja) 1985-03-08
JPS6153431B2 JPS6153431B2 (enrdf_load_stackoverflow) 1986-11-18

Family

ID=15519570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15148783A Granted JPS6043488A (ja) 1983-08-22 1983-08-22 薄膜製造装置

Country Status (1)

Country Link
JP (1) JPS6043488A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018098980A1 (zh) * 2016-11-30 2018-06-07 江苏菲沃泰纳米科技有限公司 一种等离子体聚合涂层装置
US11332829B2 (en) 2016-11-30 2022-05-17 Jiangsu Favored Nanotechnology Co., LTD Plasma polymerization coating with uniformity control
US11339477B2 (en) 2016-11-30 2022-05-24 Jiangsu Favored Nanotechnology Co., LTD Plasma polymerization coating apparatus and process

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63136127U (enrdf_load_stackoverflow) * 1987-02-27 1988-09-07
JPS63136125U (enrdf_load_stackoverflow) * 1987-02-27 1988-09-07
JPH0685829U (ja) * 1993-05-26 1994-12-13 積水化学工業株式会社 自在ドレン

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018098980A1 (zh) * 2016-11-30 2018-06-07 江苏菲沃泰纳米科技有限公司 一种等离子体聚合涂层装置
US10424465B2 (en) 2016-11-30 2019-09-24 Jiangsu Favored Nanotechnology Co., LTD Plasma polymerization coating apparatus
US11332829B2 (en) 2016-11-30 2022-05-17 Jiangsu Favored Nanotechnology Co., LTD Plasma polymerization coating with uniformity control
US11339477B2 (en) 2016-11-30 2022-05-24 Jiangsu Favored Nanotechnology Co., LTD Plasma polymerization coating apparatus and process
US12065740B2 (en) 2016-11-30 2024-08-20 Jiangsu Favored Nanotechnology Co., LTD Plasma polymerization coating with uniformity control

Also Published As

Publication number Publication date
JPS6153431B2 (enrdf_load_stackoverflow) 1986-11-18

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