JPS6033502A - ブレ−ズド格子の製造方法 - Google Patents

ブレ−ズド格子の製造方法

Info

Publication number
JPS6033502A
JPS6033502A JP14256683A JP14256683A JPS6033502A JP S6033502 A JPS6033502 A JP S6033502A JP 14256683 A JP14256683 A JP 14256683A JP 14256683 A JP14256683 A JP 14256683A JP S6033502 A JPS6033502 A JP S6033502A
Authority
JP
Japan
Prior art keywords
film
polymer film
ion
org
grating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14256683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6310401B2 (enrdf_load_stackoverflow
Inventor
Yuzo Ono
小野　雄三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP14256683A priority Critical patent/JPS6033502A/ja
Publication of JPS6033502A publication Critical patent/JPS6033502A/ja
Publication of JPS6310401B2 publication Critical patent/JPS6310401B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Drying Of Semiconductors (AREA)
JP14256683A 1983-08-05 1983-08-05 ブレ−ズド格子の製造方法 Granted JPS6033502A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14256683A JPS6033502A (ja) 1983-08-05 1983-08-05 ブレ−ズド格子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14256683A JPS6033502A (ja) 1983-08-05 1983-08-05 ブレ−ズド格子の製造方法

Publications (2)

Publication Number Publication Date
JPS6033502A true JPS6033502A (ja) 1985-02-20
JPS6310401B2 JPS6310401B2 (enrdf_load_stackoverflow) 1988-03-07

Family

ID=15318301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14256683A Granted JPS6033502A (ja) 1983-08-05 1983-08-05 ブレ−ズド格子の製造方法

Country Status (1)

Country Link
JP (1) JPS6033502A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2561197C1 (ru) * 2014-07-30 2015-08-27 Федеральное государственное бюджетное учреждение науки Казанский физико-технический институт им. Е.К. Завойского Казанского научного центра Российской Академии наук (КФТИ КазНЦ РАН) Дифракционная решетка на полимерной основе
US11119405B2 (en) * 2018-10-12 2021-09-14 Applied Materials, Inc. Techniques for forming angled structures

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2561197C1 (ru) * 2014-07-30 2015-08-27 Федеральное государственное бюджетное учреждение науки Казанский физико-технический институт им. Е.К. Завойского Казанского научного центра Российской Академии наук (КФТИ КазНЦ РАН) Дифракционная решетка на полимерной основе
US11119405B2 (en) * 2018-10-12 2021-09-14 Applied Materials, Inc. Techniques for forming angled structures

Also Published As

Publication number Publication date
JPS6310401B2 (enrdf_load_stackoverflow) 1988-03-07

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