JPS6030933B2 - 印刷用原版の製作法 - Google Patents
印刷用原版の製作法Info
- Publication number
- JPS6030933B2 JPS6030933B2 JP51069153A JP6915376A JPS6030933B2 JP S6030933 B2 JPS6030933 B2 JP S6030933B2 JP 51069153 A JP51069153 A JP 51069153A JP 6915376 A JP6915376 A JP 6915376A JP S6030933 B2 JPS6030933 B2 JP S6030933B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- printing
- transparent
- light
- transparent positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000149 argon plasma sintering Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 20
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 239000000843 powder Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 235000010724 Wisteria floribunda Nutrition 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000006224 matting agent Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical group OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 3
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical class ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 241000519995 Stachys sylvatica Species 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-N benzene-dicarboxylic acid Chemical class OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- FYIBGDKNYYMMAG-UHFFFAOYSA-N ethane-1,2-diol;terephthalic acid Chemical compound OCCO.OC(=O)C1=CC=C(C(O)=O)C=C1 FYIBGDKNYYMMAG-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 150000003504 terephthalic acids Chemical class 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical group OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/08—Photoprinting; Processes and means for preventing photoprinting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51069153A JPS6030933B2 (ja) | 1976-06-11 | 1976-06-11 | 印刷用原版の製作法 |
| DE19772725968 DE2725968A1 (de) | 1976-06-11 | 1977-06-08 | Verfahren zur herstellung einer stammplatte fuer den druck |
| FR7717869A FR2354583A1 (fr) | 1976-06-11 | 1977-06-10 | Procede perfectionne de fabrication de plaques de tirage |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51069153A JPS6030933B2 (ja) | 1976-06-11 | 1976-06-11 | 印刷用原版の製作法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52152303A JPS52152303A (en) | 1977-12-17 |
| JPS6030933B2 true JPS6030933B2 (ja) | 1985-07-19 |
Family
ID=13394429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51069153A Expired JPS6030933B2 (ja) | 1976-06-11 | 1976-06-11 | 印刷用原版の製作法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS6030933B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2725968A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2354583A1 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0450342U (enrdf_load_stackoverflow) * | 1990-09-05 | 1992-04-28 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS607428A (ja) * | 1983-06-28 | 1985-01-16 | Osaka Seihan Center Kyogyo Kumiai | 印刷用版の製法 |
| JPS608846A (ja) * | 1983-07-26 | 1985-01-17 | Osaka Seihan Center Kyogyo Kumiai | 印刷用版の製法 |
| JPS608845A (ja) * | 1983-12-27 | 1985-01-17 | Osaka Seihan Center Kyogyo Kumiai | 印刷用版の製法 |
-
1976
- 1976-06-11 JP JP51069153A patent/JPS6030933B2/ja not_active Expired
-
1977
- 1977-06-08 DE DE19772725968 patent/DE2725968A1/de not_active Withdrawn
- 1977-06-10 FR FR7717869A patent/FR2354583A1/fr active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0450342U (enrdf_load_stackoverflow) * | 1990-09-05 | 1992-04-28 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52152303A (en) | 1977-12-17 |
| DE2725968A1 (de) | 1977-12-22 |
| FR2354583A1 (fr) | 1978-01-06 |
| FR2354583B1 (enrdf_load_stackoverflow) | 1980-02-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103477281A (zh) | 感光性树脂叠层体及其热处理方法 | |
| JP4933539B2 (ja) | 一体型印刷面を有する印刷要素 | |
| JP2004526993A5 (enrdf_load_stackoverflow) | ||
| JPS6030933B2 (ja) | 印刷用原版の製作法 | |
| US3249436A (en) | Process for preparing printing plates from photopolymerizable materials by the use of a masking technique | |
| US2373489A (en) | Halftone photoengraving process | |
| US3507654A (en) | Stencil screen and method | |
| US3663223A (en) | Process for making integrated circuit masks | |
| JP2000181051A (ja) | 改良されたレリ―フ型印刷版 | |
| JPS5830755A (ja) | 露光方法 | |
| JPS60177343A (ja) | 感光板材料 | |
| US4042391A (en) | Process for forming vesicular photographic images by employing simultaneous actinic light and infra-red reflex exposure | |
| JPH039358A (ja) | グラビア印刷用版およびその製造法 | |
| JPH06230375A (ja) | 導光板の網点パターン形成方法 | |
| JP3279734B2 (ja) | フレキソ印刷板 | |
| JPH03110164A (ja) | 印刷用凸板の製造方法 | |
| US3718471A (en) | Film record card | |
| JP2740205B2 (ja) | パターン形成方法 | |
| JP3047603B2 (ja) | 印刷版の製造方法 | |
| JPS60155789A (ja) | 捺染型紙用地材及び捺染型紙の製造法 | |
| JPS5811943A (ja) | スクリ−ンレス平版印刷原版 | |
| JPS5924509Y2 (ja) | 写真植字機用文字盤 | |
| JPS60179740A (ja) | 版下原稿の作成方法 | |
| JP2006334905A (ja) | 印刷用樹脂凸版およびその製造方法 | |
| JPH03500215A (ja) | 洗い出し可能な記録担体を使用する印刷版の製造 |