JPS60261016A

JPS60261016A - 磁気記録媒体

磁気記録媒体

Info

Publication number: JPS60261016A
Authority: JP; Japan
Prior art keywords: film; magnetic; magnetic recording; layer; partially oxidized
Prior art date: 1984-06-06
Legal status : Granted

Application number

JP11592584A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0565926B2 (enrdf_load_stackoverflow

Inventor

Koichi Shinohara

紘一篠原

Current Assignee

Panasonic Holdings Corp

Original Assignee

Matsushita Electric Industrial Co Ltd

Priority date

1984-06-06

Filing date

1984-06-06

Publication date

1985-12-24

1984-06-06 Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd

1984-06-06 Priority to JP11592584A priority Critical patent/JPS60261016A/ja

1985-12-24 Publication of JPS60261016A publication Critical patent/JPS60261016A/ja

1993-09-20 Publication of JPH0565926B2 publication Critical patent/JPH0565926B2/ja

Status Granted legal-status Critical Current

Links

230000005291 magnetic effect Effects 0.000 title claims abstract description 33
238000007740 vapor deposition Methods 0.000 abstract description 5
150000002500 ions Chemical class 0.000 abstract description 4
229920000307 polymer substrate Polymers 0.000 abstract description 4
239000000758 substrate Substances 0.000 abstract description 4
239000000463 material Substances 0.000 abstract description 3
229920000728 polyester Polymers 0.000 abstract description 2
229920006393 polyether sulfone Polymers 0.000 abstract description 2
239000013078 crystal Substances 0.000 abstract 2
229910000531 Co alloy Inorganic materials 0.000 abstract 1
239000004695 Polyether sulfone Substances 0.000 abstract 1
230000015572 biosynthetic process Effects 0.000 abstract 1
239000011248 coating agent Substances 0.000 abstract 1
238000000576 coating method Methods 0.000 abstract 1
238000000151 deposition Methods 0.000 abstract 1
238000010884 ion-beam technique Methods 0.000 abstract 1
239000007769 metal material Substances 0.000 abstract 1
238000005204 segregation Methods 0.000 abstract 1
239000011651 chromium Substances 0.000 description 11
239000010410 layer Substances 0.000 description 7
238000001704 evaporation Methods 0.000 description 5
230000000694 effects Effects 0.000 description 4
239000013081 microcrystal Substances 0.000 description 4
229910052804 chromium Inorganic materials 0.000 description 3
229910001430 chromium ion Inorganic materials 0.000 description 3
230000008020 evaporation Effects 0.000 description 3
230000005294 ferromagnetic effect Effects 0.000 description 3
239000010408 film Substances 0.000 description 3
-1 polyethylene terephthalate Polymers 0.000 description 3
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
238000010586 diagram Methods 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
229910052759 nickel Inorganic materials 0.000 description 2
229920001721 polyimide Polymers 0.000 description 2
239000010409 thin film Substances 0.000 description 2
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229910020598 Co Fe Inorganic materials 0.000 description 1
229910020634 Co Mg Inorganic materials 0.000 description 1
229910002519 Co-Fe Inorganic materials 0.000 description 1
229910020674 Co—B Inorganic materials 0.000 description 1
229910020705 Co—Rh Inorganic materials 0.000 description 1
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239000004952 Polyamide Substances 0.000 description 1
239000004962 Polyamide-imide Substances 0.000 description 1
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238000002441 X-ray diffraction Methods 0.000 description 1
NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
239000002253 acid Substances 0.000 description 1
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229910045601 alloy Inorganic materials 0.000 description 1
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QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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239000001913 cellulose Substances 0.000 description 1
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238000005566 electron beam evaporation Methods 0.000 description 1
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238000005468 ion implantation Methods 0.000 description 1
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229910052748 manganese Inorganic materials 0.000 description 1
238000000034 method Methods 0.000 description 1
229910052750 molybdenum Inorganic materials 0.000 description 1
TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
238000004157 plasmatron Methods 0.000 description 1
229920002647 polyamide Polymers 0.000 description 1
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229920000139 polyethylene terephthalate Polymers 0.000 description 1
239000005020 polyethylene terephthalate Substances 0.000 description 1
229920000098 polyolefin Polymers 0.000 description 1
229920001155 polypropylene Polymers 0.000 description 1
229910052707 ruthenium Inorganic materials 0.000 description 1
238000004904 shortening Methods 0.000 description 1
239000000377 silicon dioxide Substances 0.000 description 1
230000003746 surface roughness Effects 0.000 description 1
229910052715 tantalum Inorganic materials 0.000 description 1
229910052720 vanadium Inorganic materials 0.000 description 1
238000004804 winding Methods 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
229910000859 α-Fe Inorganic materials 0.000 description 1