JPS6025211A - 窒化鉄膜の形成方法 - Google Patents
窒化鉄膜の形成方法Info
- Publication number
- JPS6025211A JPS6025211A JP13303183A JP13303183A JPS6025211A JP S6025211 A JPS6025211 A JP S6025211A JP 13303183 A JP13303183 A JP 13303183A JP 13303183 A JP13303183 A JP 13303183A JP S6025211 A JPS6025211 A JP S6025211A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- target
- sputtering
- ion beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 10
- 230000015572 biosynthetic process Effects 0.000 title description 5
- 239000002245 particle Substances 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 21
- 238000000151 deposition Methods 0.000 claims abstract description 9
- 230000005684 electric field Effects 0.000 claims abstract description 9
- 239000010408 film Substances 0.000 abstract description 60
- 239000000758 substrate Substances 0.000 abstract description 38
- 238000010884 ion-beam technique Methods 0.000 abstract description 17
- 238000004544 sputter deposition Methods 0.000 abstract description 16
- 150000002500 ions Chemical class 0.000 abstract description 13
- 230000002349 favourable effect Effects 0.000 abstract description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 230000007423 decrease Effects 0.000 description 14
- 239000007789 gas Substances 0.000 description 13
- 230000005415 magnetization Effects 0.000 description 11
- 239000013078 crystal Substances 0.000 description 10
- 229910000859 α-Fe Inorganic materials 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 238000007737 ion beam deposition Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229910000727 Fe4N Inorganic materials 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000009795 derivation Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 229910000705 Fe2N Inorganic materials 0.000 description 1
- 230000027311 M phase Effects 0.000 description 1
- 241001333909 Soter Species 0.000 description 1
- YYXHRUSBEPGBCD-UHFFFAOYSA-N azanylidyneiron Chemical compound [N].[Fe] YYXHRUSBEPGBCD-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910001337 iron nitride Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13303183A JPS6025211A (ja) | 1983-07-20 | 1983-07-20 | 窒化鉄膜の形成方法 |
| US06/630,514 US4690744A (en) | 1983-07-20 | 1984-07-13 | Method of ion beam generation and an apparatus based on such method |
| DE8484304963T DE3480039D1 (en) | 1983-07-20 | 1984-07-20 | A method and apparatus for ion beam generation |
| EP84304963A EP0132398B1 (en) | 1983-07-20 | 1984-07-20 | A method and apparatus for ion beam generation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13303183A JPS6025211A (ja) | 1983-07-20 | 1983-07-20 | 窒化鉄膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6025211A true JPS6025211A (ja) | 1985-02-08 |
| JPH035644B2 JPH035644B2 (enrdf_load_stackoverflow) | 1991-01-28 |
Family
ID=15095184
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13303183A Granted JPS6025211A (ja) | 1983-07-20 | 1983-07-20 | 窒化鉄膜の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6025211A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62204504A (ja) * | 1986-03-04 | 1987-09-09 | Nippon Telegr & Teleph Corp <Ntt> | アモルフアス軟磁性膜及びその製造方法 |
| JPH04270017A (ja) * | 1991-02-25 | 1992-09-25 | Press Gijutsu Kenkyusho:Kk | プレス送り装置のリリース装置 |
| JPH09125233A (ja) * | 1995-10-31 | 1997-05-13 | Toda Kogyo Corp | ＮｉＯ配向膜の製造法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57157511A (en) * | 1981-03-24 | 1982-09-29 | Teijin Ltd | Opposite target type sputtering device |
| JPS5836908A (ja) * | 1981-08-24 | 1983-03-04 | Sumitomo Special Metals Co Ltd | 窒化物薄膜軟質磁性体の製造法 |
-
1983
- 1983-07-20 JP JP13303183A patent/JPS6025211A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57157511A (en) * | 1981-03-24 | 1982-09-29 | Teijin Ltd | Opposite target type sputtering device |
| JPS5836908A (ja) * | 1981-08-24 | 1983-03-04 | Sumitomo Special Metals Co Ltd | 窒化物薄膜軟質磁性体の製造法 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62204504A (ja) * | 1986-03-04 | 1987-09-09 | Nippon Telegr & Teleph Corp <Ntt> | アモルフアス軟磁性膜及びその製造方法 |
| JPH04270017A (ja) * | 1991-02-25 | 1992-09-25 | Press Gijutsu Kenkyusho:Kk | プレス送り装置のリリース装置 |
| JPH09125233A (ja) * | 1995-10-31 | 1997-05-13 | Toda Kogyo Corp | ＮｉＯ配向膜の製造法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH035644B2 (enrdf_load_stackoverflow) | 1991-01-28 |
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