JPS60246622A - 半導体結晶層の製造方法 - Google Patents
半導体結晶層の製造方法Info
- Publication number
- JPS60246622A JPS60246622A JP59101775A JP10177584A JPS60246622A JP S60246622 A JPS60246622 A JP S60246622A JP 59101775 A JP59101775 A JP 59101775A JP 10177584 A JP10177584 A JP 10177584A JP S60246622 A JPS60246622 A JP S60246622A
- Authority
- JP
- Japan
- Prior art keywords
- opening
- layer
- single crystal
- semiconductor
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P34/00—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
- H10P34/40—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation
- H10P34/42—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation with electromagnetic radiation, e.g. laser annealing
Landscapes
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59101775A JPS60246622A (ja) | 1984-05-22 | 1984-05-22 | 半導体結晶層の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59101775A JPS60246622A (ja) | 1984-05-22 | 1984-05-22 | 半導体結晶層の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60246622A true JPS60246622A (ja) | 1985-12-06 |
| JPH0149003B2 JPH0149003B2 (enFirst) | 1989-10-23 |
Family
ID=14309584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59101775A Granted JPS60246622A (ja) | 1984-05-22 | 1984-05-22 | 半導体結晶層の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60246622A (enFirst) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63169023A (ja) * | 1987-01-07 | 1988-07-13 | Agency Of Ind Science & Technol | Soi結晶成長法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5781583A (en) * | 1980-11-11 | 1982-05-21 | Nichibei Buraindo Kogyo Kk | Lifting and inclining apparatus of blind |
| JPS5996383A (ja) * | 1982-11-19 | 1984-06-02 | 立川ブラインド工業株式会社 | ヘツドボツクス昇降型ブラインドの開閉駆動装置 |
-
1984
- 1984-05-22 JP JP59101775A patent/JPS60246622A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5781583A (en) * | 1980-11-11 | 1982-05-21 | Nichibei Buraindo Kogyo Kk | Lifting and inclining apparatus of blind |
| JPS5996383A (ja) * | 1982-11-19 | 1984-06-02 | 立川ブラインド工業株式会社 | ヘツドボツクス昇降型ブラインドの開閉駆動装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63169023A (ja) * | 1987-01-07 | 1988-07-13 | Agency Of Ind Science & Technol | Soi結晶成長法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0149003B2 (enFirst) | 1989-10-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |