JPS60246605A - コイル体 - Google Patents
コイル体Info
- Publication number
- JPS60246605A JPS60246605A JP3686485A JP3686485A JPS60246605A JP S60246605 A JPS60246605 A JP S60246605A JP 3686485 A JP3686485 A JP 3686485A JP 3686485 A JP3686485 A JP 3686485A JP S60246605 A JPS60246605 A JP S60246605A
- Authority
- JP
- Japan
- Prior art keywords
- insulating layer
- conductive layer
- coil
- layer
- coil body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- 239000004020 conductor Substances 0.000 claims description 12
- 238000005530 etching Methods 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 10
- 239000013067 intermediate product Substances 0.000 abstract description 7
- 238000007740 vapor deposition Methods 0.000 abstract description 5
- 229910052782 aluminium Inorganic materials 0.000 abstract description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 4
- 238000005498 polishing Methods 0.000 abstract description 4
- 238000004544 sputter deposition Methods 0.000 abstract description 4
- 238000001259 photo etching Methods 0.000 abstract description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 description 21
- 239000010408 film Substances 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 206010011224 Cough Diseases 0.000 description 1
- 241001492658 Cyanea koolauensis Species 0.000 description 1
- 210000003323 beak Anatomy 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- OOYGSFOGFJDDHP-KMCOLRRFSA-N kanamycin A sulfate Chemical group OS(O)(=O)=O.O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CN)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O[C@@H]2[C@@H]([C@@H](N)[C@H](O)[C@@H](CO)O2)O)[C@H](N)C[C@@H]1N OOYGSFOGFJDDHP-KMCOLRRFSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/041—Printed circuit coils
- H01F41/042—Printed circuit coils by thin film techniques
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Coils Or Transformers For Communication (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3686485A JPS60246605A (ja) | 1985-02-26 | 1985-02-26 | コイル体 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3686485A JPS60246605A (ja) | 1985-02-26 | 1985-02-26 | コイル体 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2261278A Division JPS54115760A (en) | 1978-02-28 | 1978-02-28 | Method of producing multiilayer thin film inductance |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60246605A true JPS60246605A (ja) | 1985-12-06 |
JPH0442804B2 JPH0442804B2 (enrdf_load_stackoverflow) | 1992-07-14 |
Family
ID=12481648
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3686485A Granted JPS60246605A (ja) | 1985-02-26 | 1985-02-26 | コイル体 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60246605A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2637762A1 (fr) * | 1988-08-19 | 1990-04-13 | Murata Manufacturing Co | Enroulement pour puce electronique et son procede de fabrication |
JP2002299121A (ja) * | 2001-04-02 | 2002-10-11 | Kawasaki Steel Corp | 平面磁気素子 |
CN108303596A (zh) * | 2018-01-16 | 2018-07-20 | 宁波市计量测试研究院(宁波市衡器管理所、宁波新材料检验检测中心) | 一种利用薄膜沉积技术制作超薄线圈的方法及超薄线圈 |
-
1985
- 1985-02-26 JP JP3686485A patent/JPS60246605A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2637762A1 (fr) * | 1988-08-19 | 1990-04-13 | Murata Manufacturing Co | Enroulement pour puce electronique et son procede de fabrication |
US5071509A (en) * | 1988-08-19 | 1991-12-10 | Murata Mfg. Co., Ltd | Chip coil manufacturing method |
JP2002299121A (ja) * | 2001-04-02 | 2002-10-11 | Kawasaki Steel Corp | 平面磁気素子 |
CN108303596A (zh) * | 2018-01-16 | 2018-07-20 | 宁波市计量测试研究院(宁波市衡器管理所、宁波新材料检验检测中心) | 一种利用薄膜沉积技术制作超薄线圈的方法及超薄线圈 |
Also Published As
Publication number | Publication date |
---|---|
JPH0442804B2 (enrdf_load_stackoverflow) | 1992-07-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100923994B1 (ko) | 모놀리식 회로에서 인덕턴스 및 비아 형성 | |
US5281769A (en) | Dewall plating technique | |
US5652157A (en) | Forming a gate electrode on a semiconductor substrate by using a T-shaped dummy gate | |
TW519723B (en) | Method for forming multi-level metal interconnection | |
US3893156A (en) | Novel beam lead integrated circuit structure and method for making the same including automatic registration of beam leads with corresponding dielectric substrate leads | |
US6368514B1 (en) | Method and apparatus for batch processed capacitors using masking techniques | |
CN118658849A (zh) | 封装基板及其制法 | |
JPS60246605A (ja) | コイル体 | |
JPS63150940A (ja) | 基板上に複数の素子を間隔をおいて形成するための方法 | |
US4922323A (en) | Hermetically sealed multilayer electrical feedthru | |
KR890011035A (ko) | 집적회로 제조방법 및 전기접속 형성방법 | |
JP3498190B2 (ja) | 薄膜積層電極の製造方法 | |
US4747908A (en) | Method of making a hermetically sealed multilayer electrical feedthru | |
JPH07297590A (ja) | 同軸構造の配線の形成方法 | |
JPS59104718A (ja) | 薄膜磁気ヘツドの製造方法 | |
JPH01150305A (ja) | 超伝導磁石用コイル及びその製造方法 | |
JPS5935165B2 (ja) | 多層薄膜コイルの製法 | |
JPH0620101B2 (ja) | 半導体装置 | |
JPS6066435A (ja) | 薄膜形成方法 | |
JPS6347952A (ja) | 半導体装置 | |
JPH01117329A (ja) | 薄膜装置の絶縁膜製造方法 | |
JPS5827664B2 (ja) | 平坦表面を有する装置の製造方法 | |
JPH04162795A (ja) | 薄膜多層基板 | |
JPS61100950A (ja) | 半導体素子の製造方法 | |
JPS639952A (ja) | 半導体装置の製造方法 |