JPS60245226A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS60245226A
JPS60245226A JP59101922A JP10192284A JPS60245226A JP S60245226 A JPS60245226 A JP S60245226A JP 59101922 A JP59101922 A JP 59101922A JP 10192284 A JP10192284 A JP 10192284A JP S60245226 A JPS60245226 A JP S60245226A
Authority
JP
Japan
Prior art keywords
pattern
exposed
patterns
independent
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59101922A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0122725B2 (enExample
Inventor
Takeshi Hoshino
健 星野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP59101922A priority Critical patent/JPS60245226A/ja
Publication of JPS60245226A publication Critical patent/JPS60245226A/ja
Publication of JPH0122725B2 publication Critical patent/JPH0122725B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP59101922A 1984-05-21 1984-05-21 パタ−ン形成方法 Granted JPS60245226A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59101922A JPS60245226A (ja) 1984-05-21 1984-05-21 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59101922A JPS60245226A (ja) 1984-05-21 1984-05-21 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS60245226A true JPS60245226A (ja) 1985-12-05
JPH0122725B2 JPH0122725B2 (enExample) 1989-04-27

Family

ID=14313399

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59101922A Granted JPS60245226A (ja) 1984-05-21 1984-05-21 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS60245226A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6275442A (ja) * 1985-09-26 1987-04-07 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン 感光性ラツカ−層の露光量決定方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6275442A (ja) * 1985-09-26 1987-04-07 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン 感光性ラツカ−層の露光量決定方法

Also Published As

Publication number Publication date
JPH0122725B2 (enExample) 1989-04-27

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