JPS60240039A - イオン銃 - Google Patents

イオン銃

Info

Publication number
JPS60240039A
JPS60240039A JP59095330A JP9533084A JPS60240039A JP S60240039 A JPS60240039 A JP S60240039A JP 59095330 A JP59095330 A JP 59095330A JP 9533084 A JP9533084 A JP 9533084A JP S60240039 A JPS60240039 A JP S60240039A
Authority
JP
Japan
Prior art keywords
aperture
source
ion
ion gun
grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59095330A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0562421B2 (enrdf_load_stackoverflow
Inventor
Ryuichi Shimizu
志水 隆一
Isao Kato
勲 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Shimazu Seisakusho KK
Original Assignee
Shimadzu Corp
Shimazu Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Shimazu Seisakusho KK filed Critical Shimadzu Corp
Priority to JP59095330A priority Critical patent/JPS60240039A/ja
Publication of JPS60240039A publication Critical patent/JPS60240039A/ja
Publication of JPH0562421B2 publication Critical patent/JPH0562421B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/08Ion sources; Ion guns using arc discharge
    • H01J27/14Other arc discharge ion sources using an applied magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
JP59095330A 1984-05-11 1984-05-11 イオン銃 Granted JPS60240039A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59095330A JPS60240039A (ja) 1984-05-11 1984-05-11 イオン銃

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59095330A JPS60240039A (ja) 1984-05-11 1984-05-11 イオン銃

Publications (2)

Publication Number Publication Date
JPS60240039A true JPS60240039A (ja) 1985-11-28
JPH0562421B2 JPH0562421B2 (enrdf_load_stackoverflow) 1993-09-08

Family

ID=14134707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59095330A Granted JPS60240039A (ja) 1984-05-11 1984-05-11 イオン銃

Country Status (1)

Country Link
JP (1) JPS60240039A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190229A (ja) * 1987-01-31 1988-08-05 Tokyo Electron Ltd 電子ビ−ム励起イオン源
JPH02168541A (ja) * 1988-12-20 1990-06-28 Rikagaku Kenkyusho 電子ビーム励起イオン源
CN102789953A (zh) * 2011-05-19 2012-11-21 安徽中科大建成海晟科技有限责任公司 一种用于飞行时间质谱计的新型离子源
CN103325648A (zh) * 2012-03-22 2013-09-25 斯伊恩股份有限公司 离子源装置及离子束生成方法
GB2517830A (en) * 2013-06-24 2015-03-04 Agilent Technologies Inc Axial magnetic ion source and related ionization methods
JPWO2020203186A1 (enrdf_load_stackoverflow) * 2019-04-03 2020-10-08

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190229A (ja) * 1987-01-31 1988-08-05 Tokyo Electron Ltd 電子ビ−ム励起イオン源
JPH02168541A (ja) * 1988-12-20 1990-06-28 Rikagaku Kenkyusho 電子ビーム励起イオン源
CN102789953A (zh) * 2011-05-19 2012-11-21 安徽中科大建成海晟科技有限责任公司 一种用于飞行时间质谱计的新型离子源
CN103325648A (zh) * 2012-03-22 2013-09-25 斯伊恩股份有限公司 离子源装置及离子束生成方法
JP2013196985A (ja) * 2012-03-22 2013-09-30 Sen Corp イオン源装置及びイオンビーム生成方法
KR20130108141A (ko) * 2012-03-22 2013-10-02 가부시키가이샤 에스이엔 이온원장치 및 이온빔 생성방법
US9153405B2 (en) 2012-03-22 2015-10-06 Sen Corporation Ion source device and ion beam generating method
GB2517830A (en) * 2013-06-24 2015-03-04 Agilent Technologies Inc Axial magnetic ion source and related ionization methods
US9117617B2 (en) 2013-06-24 2015-08-25 Agilent Technologies, Inc. Axial magnetic ion source and related ionization methods
GB2517830B (en) * 2013-06-24 2018-04-11 Agilent Technologies Inc Axial magnetic ion source and related ionization methods
JPWO2020203186A1 (enrdf_load_stackoverflow) * 2019-04-03 2020-10-08
WO2020203186A1 (ja) * 2019-04-03 2020-10-08 国立研究開発法人量子科学技術研究開発機構 イオン源と、それを備えた多種イオン生成装置

Also Published As

Publication number Publication date
JPH0562421B2 (enrdf_load_stackoverflow) 1993-09-08

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term