JPS60234965A - 薄膜製造方法 - Google Patents
薄膜製造方法Info
- Publication number
- JPS60234965A JPS60234965A JP59088474A JP8847484A JPS60234965A JP S60234965 A JPS60234965 A JP S60234965A JP 59088474 A JP59088474 A JP 59088474A JP 8847484 A JP8847484 A JP 8847484A JP S60234965 A JPS60234965 A JP S60234965A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- metal
- gas
- coated
- partial pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000000463 material Substances 0.000 claims abstract description 26
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims description 39
- 239000002184 metal Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 15
- 239000010408 film Substances 0.000 claims description 5
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 abstract description 12
- 239000012495 reaction gas Substances 0.000 abstract description 10
- 230000008020 evaporation Effects 0.000 abstract description 9
- 230000007704 transition Effects 0.000 abstract description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052760 oxygen Inorganic materials 0.000 abstract description 6
- 239000001301 oxygen Substances 0.000 abstract description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 21
- 239000010410 layer Substances 0.000 description 14
- 150000002500 ions Chemical class 0.000 description 8
- 239000000126 substance Substances 0.000 description 7
- 239000000446 fuel Substances 0.000 description 6
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 150000002736 metal compounds Chemical class 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Fuel-Injection Apparatus (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59088474A JPS60234965A (ja) | 1984-05-04 | 1984-05-04 | 薄膜製造方法 |
| GB08510576A GB2158104A (en) | 1984-05-04 | 1985-04-25 | Method for producing a thin film |
| KR1019850002947A KR900009101B1 (ko) | 1984-05-04 | 1985-05-01 | 박막 제조방법 |
| DE19853515807 DE3515807A1 (de) | 1984-05-04 | 1985-05-02 | Verfahren zur herstellung eines duennen films |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59088474A JPS60234965A (ja) | 1984-05-04 | 1984-05-04 | 薄膜製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60234965A true JPS60234965A (ja) | 1985-11-21 |
| JPH0237426B2 JPH0237426B2 (enrdf_load_stackoverflow) | 1990-08-24 |
Family
ID=13943770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59088474A Granted JPS60234965A (ja) | 1984-05-04 | 1984-05-04 | 薄膜製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS60234965A (enrdf_load_stackoverflow) |
| KR (1) | KR900009101B1 (enrdf_load_stackoverflow) |
| DE (1) | DE3515807A1 (enrdf_load_stackoverflow) |
| GB (1) | GB2158104A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01165759A (ja) * | 1987-12-22 | 1989-06-29 | Seiko Epson Corp | スパッタ成膜法 |
| JP2009280853A (ja) * | 2008-05-21 | 2009-12-03 | Osg Corp | 硬質被膜および硬質被膜被覆工具 |
| JP2011256424A (ja) * | 2010-06-08 | 2011-12-22 | Citizen Holdings Co Ltd | 硬質装飾部材 |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8508338D0 (en) * | 1985-03-29 | 1985-05-09 | British Aerospace | Application of stop-off coating |
| JPS6222314A (ja) * | 1985-07-22 | 1987-01-30 | 株式会社ボッシュオートモーティブ システム | 薄膜製造方法 |
| CH669347A5 (enrdf_load_stackoverflow) * | 1986-05-28 | 1989-03-15 | Vni Instrument Inst | |
| US5021365A (en) * | 1986-06-16 | 1991-06-04 | International Business Machines Corporation | Compound semiconductor interface control using cationic ingredient oxide to prevent fermi level pinning |
| KR920002168B1 (ko) * | 1986-09-25 | 1992-03-19 | 유니온 카바이드 코포레이션 | 질화지르코늄 피복제품과 그 제조방법 |
| US4859253A (en) * | 1988-07-20 | 1989-08-22 | International Business Machines Corporation | Method for passivating a compound semiconductor surface and device having improved semiconductor-insulator interface |
| US4904542A (en) * | 1988-10-11 | 1990-02-27 | Midwest Research Technologies, Inc. | Multi-layer wear resistant coatings |
| USRE34173E (en) * | 1988-10-11 | 1993-02-02 | Midwest Research Technologies, Inc. | Multi-layer wear resistant coatings |
| GB9005321D0 (en) * | 1990-03-09 | 1990-05-02 | Matthews Allan | Modulated structure composites produced by vapour disposition |
| JPH04368A (ja) * | 1990-04-17 | 1992-01-06 | Riken Corp | 耐摩耗性被膜及びその製造法 |
| ATE171732T1 (de) * | 1992-07-02 | 1998-10-15 | Balzers Hochvakuum | Verfahren zur herstellung einer metalloxidschicht, vakuumbehandlungsanlage hierfür sowie mit mindestens einer metalloxidschicht beschichteter teil |
| US5672386A (en) * | 1994-10-27 | 1997-09-30 | Kabushiki Kaisha Riken | Process for forming a coating of chromium and nitrogen having good wear resistance properties |
| US5587227A (en) * | 1994-10-27 | 1996-12-24 | Kabushiki Kaisha Riken | Coating of chromium and nitrogen having good wear resistance properties |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5173981A (enrdf_load_stackoverflow) * | 1974-12-25 | 1976-06-26 | Ulvac Corp |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1335065A (en) * | 1970-06-22 | 1973-10-24 | Optical Coating Laboratory Inc | Coated plastics articles and methods of manufacture thereof |
| US3823995A (en) * | 1972-03-30 | 1974-07-16 | Corning Glass Works | Method of forming light focusing fiber waveguide |
| US3791852A (en) * | 1972-06-16 | 1974-02-12 | Univ California | High rate deposition of carbides by activated reactive evaporation |
| US3900592A (en) * | 1973-07-25 | 1975-08-19 | Airco Inc | Method for coating a substrate to provide a titanium or zirconium nitride or carbide deposit having a hardness gradient which increases outwardly from the substrate |
| DE2605174B2 (de) * | 1976-02-10 | 1978-07-27 | Resista Fabrik Elektrischer Widerstaende Gmbh, 8300 Landshut | Verfahren zur Herstellung von Dünnschicht-Widerstandselementen |
| DE2705225C2 (de) * | 1976-06-07 | 1983-03-24 | Nobuo Tokyo Nishida | Ornamentteil für Uhren usw. |
| JPS5625960A (en) * | 1979-08-09 | 1981-03-12 | Mitsubishi Metal Corp | Surface-coated high speed steel material for cutting tool |
| JPS5779169A (en) * | 1980-11-06 | 1982-05-18 | Sumitomo Electric Ind Ltd | Physical vapor deposition method |
| DE3507927A1 (de) * | 1985-03-06 | 1986-09-11 | Dr.Ing.H.C. F. Porsche Ag, 7000 Stuttgart | Verfahren und handgeraet zum halbmechanischen verzinken von blechoberflaechen |
-
1984
- 1984-05-04 JP JP59088474A patent/JPS60234965A/ja active Granted
-
1985
- 1985-04-25 GB GB08510576A patent/GB2158104A/en not_active Withdrawn
- 1985-05-01 KR KR1019850002947A patent/KR900009101B1/ko not_active Expired
- 1985-05-02 DE DE19853515807 patent/DE3515807A1/de not_active Ceased
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5173981A (enrdf_load_stackoverflow) * | 1974-12-25 | 1976-06-26 | Ulvac Corp |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01165759A (ja) * | 1987-12-22 | 1989-06-29 | Seiko Epson Corp | スパッタ成膜法 |
| JP2009280853A (ja) * | 2008-05-21 | 2009-12-03 | Osg Corp | 硬質被膜および硬質被膜被覆工具 |
| JP2011256424A (ja) * | 2010-06-08 | 2011-12-22 | Citizen Holdings Co Ltd | 硬質装飾部材 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2158104A (en) | 1985-11-06 |
| GB8510576D0 (en) | 1985-05-30 |
| DE3515807A1 (de) | 1985-11-07 |
| JPH0237426B2 (enrdf_load_stackoverflow) | 1990-08-24 |
| KR900009101B1 (ko) | 1990-12-22 |
| KR850007987A (ko) | 1985-12-11 |
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