JPS60215759A - 薄膜形成装置 - Google Patents

薄膜形成装置

Info

Publication number
JPS60215759A
JPS60215759A JP7119684A JP7119684A JPS60215759A JP S60215759 A JPS60215759 A JP S60215759A JP 7119684 A JP7119684 A JP 7119684A JP 7119684 A JP7119684 A JP 7119684A JP S60215759 A JPS60215759 A JP S60215759A
Authority
JP
Japan
Prior art keywords
vapor
substrate
thermocouple
crucible
sheath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7119684A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0219187B2 (enrdf_load_stackoverflow
Inventor
Tateo Motoyoshi
本吉　健郎
Masahiro Hanai
正博 花井
Kenichiro Yamanishi
山西　健一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP7119684A priority Critical patent/JPS60215759A/ja
Publication of JPS60215759A publication Critical patent/JPS60215759A/ja
Publication of JPH0219187B2 publication Critical patent/JPH0219187B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP7119684A 1984-04-09 1984-04-09 薄膜形成装置 Granted JPS60215759A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7119684A JPS60215759A (ja) 1984-04-09 1984-04-09 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7119684A JPS60215759A (ja) 1984-04-09 1984-04-09 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS60215759A true JPS60215759A (ja) 1985-10-29
JPH0219187B2 JPH0219187B2 (enrdf_load_stackoverflow) 1990-04-27

Family

ID=13453670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7119684A Granted JPS60215759A (ja) 1984-04-09 1984-04-09 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS60215759A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0165855U (enrdf_load_stackoverflow) * 1987-10-20 1989-04-27
US4982696A (en) * 1988-01-08 1991-01-08 Ricoh Company, Ltd. Apparatus for forming thin film
US8360002B2 (en) * 2006-07-14 2013-01-29 Georgia Tech Research Corporation In-situ flux measurement devices, methods, and systems

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0453285U (enrdf_load_stackoverflow) * 1990-09-11 1992-05-07
JPH0557008U (ja) * 1991-12-27 1993-07-30 日本道路興業株式会社 漢字とローマ字との併用標示による道路標識

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0165855U (enrdf_load_stackoverflow) * 1987-10-20 1989-04-27
US4982696A (en) * 1988-01-08 1991-01-08 Ricoh Company, Ltd. Apparatus for forming thin film
US8360002B2 (en) * 2006-07-14 2013-01-29 Georgia Tech Research Corporation In-situ flux measurement devices, methods, and systems
US8377518B2 (en) * 2006-07-14 2013-02-19 Georgia Tech Research Corporation In-situ flux measurement devices, methods, and systems

Also Published As

Publication number Publication date
JPH0219187B2 (enrdf_load_stackoverflow) 1990-04-27

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