JPS60202981A - 半導体レ−ザ装置 - Google Patents
半導体レ−ザ装置Info
- Publication number
- JPS60202981A JPS60202981A JP6021784A JP6021784A JPS60202981A JP S60202981 A JPS60202981 A JP S60202981A JP 6021784 A JP6021784 A JP 6021784A JP 6021784 A JP6021784 A JP 6021784A JP S60202981 A JPS60202981 A JP S60202981A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- laser device
- quantum well
- active layer
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
- H01S5/3215—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities graded composition cladding layers
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6021784A JPS60202981A (ja) | 1984-03-28 | 1984-03-28 | 半導体レ−ザ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6021784A JPS60202981A (ja) | 1984-03-28 | 1984-03-28 | 半導体レ−ザ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60202981A true JPS60202981A (ja) | 1985-10-14 |
| JPH0141269B2 JPH0141269B2 (enExample) | 1989-09-04 |
Family
ID=13135772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6021784A Granted JPS60202981A (ja) | 1984-03-28 | 1984-03-28 | 半導体レ−ザ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60202981A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63129685A (ja) * | 1986-11-20 | 1988-06-02 | Sanyo Electric Co Ltd | 半導体レ−ザ |
| JPH01236670A (ja) * | 1988-03-17 | 1989-09-21 | Nec Corp | 半導体素子 |
| JPH02174178A (ja) * | 1988-12-26 | 1990-07-05 | Sharp Corp | 半導体レーザ素子 |
-
1984
- 1984-03-28 JP JP6021784A patent/JPS60202981A/ja active Granted
Non-Patent Citations (5)
| Title |
|---|
| APPL. PHY. LETT. 40 3 EXTREMELY LOW THRESHOLD ALGA AS GRADED-INDEX WAVEGUIDE SEPARATE-CONFINEMENT HETEROSTORUCTURE LASERS GROWN BY MOLECULAR BEAM EPITAXY=1982 * |
| APPLIED DHYSICS LETTERS=1981 * |
| APPLIED PHYSICS LETTERS=1981 * |
| APPLIED PHYSICS LETTERS=1984 * |
| COLLECTED PAPERS 2ND INTERNATIONAL SYMPOSIUM ON MOLECULAR BEAM EPITAXY AND RELATED CLEAN SURFACE TECHNIQUES=1982 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63129685A (ja) * | 1986-11-20 | 1988-06-02 | Sanyo Electric Co Ltd | 半導体レ−ザ |
| JPH01236670A (ja) * | 1988-03-17 | 1989-09-21 | Nec Corp | 半導体素子 |
| JPH02174178A (ja) * | 1988-12-26 | 1990-07-05 | Sharp Corp | 半導体レーザ素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0141269B2 (enExample) | 1989-09-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0449691A (ja) | 可視光レーザダイオード | |
| JPH07154023A (ja) | 半導体レーザ装置 | |
| JPS62200784A (ja) | 半導体レ−ザ装置 | |
| JPH0677580A (ja) | オプトエレクトロニクス部品用の半導体構造 | |
| JPS60202981A (ja) | 半導体レ−ザ装置 | |
| JPS6298690A (ja) | 半導体レ−ザ素子及びその製造方法 | |
| JPS6288318A (ja) | 半導体装置の製造方法 | |
| JPH0834338B2 (ja) | 半導体レーザ | |
| JPS637691A (ja) | 半導体レ−ザ装置 | |
| JP2697589B2 (ja) | 超格子構造体 | |
| JPS61154191A (ja) | 半導体レ−ザ素子 | |
| JP3156682B2 (ja) | 半導体素子及びその製造方法 | |
| JPH08264558A (ja) | 化合物半導体装置とその製造方法 | |
| JPH07169701A (ja) | 3−5族半導体薄膜の成長方法 | |
| JPH0712101B2 (ja) | 半導体発光装置 | |
| JPH0653613A (ja) | 半導体素子 | |
| JPS63204686A (ja) | 半導体装置の製造方法 | |
| JPH0258287A (ja) | 半導体レーザ装置 | |
| JPH02114583A (ja) | 半導体レーザの製造方法 | |
| JPH06310543A (ja) | 半導体装置 | |
| JPH06275910A (ja) | 半導体発光装置 | |
| JPS60213076A (ja) | 半導体レ−ザ | |
| JPS6365680A (ja) | トンネルダイオ−ド型半導体装置 | |
| JPS63196073A (ja) | 半導体装置 | |
| JPS6175583A (ja) | 半導体レ−ザ |