JPS6016810A - 表面被覆膜の製造方法 - Google Patents

表面被覆膜の製造方法

Info

Publication number
JPS6016810A
JPS6016810A JP58124163A JP12416383A JPS6016810A JP S6016810 A JPS6016810 A JP S6016810A JP 58124163 A JP58124163 A JP 58124163A JP 12416383 A JP12416383 A JP 12416383A JP S6016810 A JPS6016810 A JP S6016810A
Authority
JP
Japan
Prior art keywords
film
substrate
silicon carbide
coating film
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58124163A
Other languages
English (en)
Japanese (ja)
Other versions
JPS64323B2 (enrdf_load_stackoverflow
Inventor
Minoru Takamizawa
高見沢　稔
Susumu Ueno
進 上野
Tatsuhiko Motomiya
本宮　達彦
Tamaki Iida
飯田　玉樹
Fujitsugu Fujino
藤野　藤次
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP58124163A priority Critical patent/JPS6016810A/ja
Publication of JPS6016810A publication Critical patent/JPS6016810A/ja
Publication of JPS64323B2 publication Critical patent/JPS64323B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
JP58124163A 1983-07-08 1983-07-08 表面被覆膜の製造方法 Granted JPS6016810A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58124163A JPS6016810A (ja) 1983-07-08 1983-07-08 表面被覆膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58124163A JPS6016810A (ja) 1983-07-08 1983-07-08 表面被覆膜の製造方法

Publications (2)

Publication Number Publication Date
JPS6016810A true JPS6016810A (ja) 1985-01-28
JPS64323B2 JPS64323B2 (enrdf_load_stackoverflow) 1989-01-06

Family

ID=14878499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58124163A Granted JPS6016810A (ja) 1983-07-08 1983-07-08 表面被覆膜の製造方法

Country Status (1)

Country Link
JP (1) JPS6016810A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5041303A (en) * 1988-03-07 1991-08-20 Polyplasma Incorporated Process for modifying large polymeric surfaces
JPH0472067A (ja) * 1990-05-15 1992-03-06 Toagosei Chem Ind Co Ltd 炭化珪素膜を有する物品の製造方法
JP2008540771A (ja) * 2005-05-12 2008-11-20 ダウ・コーニング・アイルランド・リミテッド 接着剤を基材に、プライマーを介して、結合させてみる

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5041303A (en) * 1988-03-07 1991-08-20 Polyplasma Incorporated Process for modifying large polymeric surfaces
JPH0472067A (ja) * 1990-05-15 1992-03-06 Toagosei Chem Ind Co Ltd 炭化珪素膜を有する物品の製造方法
JP2008540771A (ja) * 2005-05-12 2008-11-20 ダウ・コーニング・アイルランド・リミテッド 接着剤を基材に、プライマーを介して、結合させてみる

Also Published As

Publication number Publication date
JPS64323B2 (enrdf_load_stackoverflow) 1989-01-06

Similar Documents

Publication Publication Date Title
US5165955A (en) Method of depositing a coating containing silicon and oxygen
JP4280412B2 (ja) けい素・窒素ベースフィルムおよびその製作方法
JPH09186153A (ja) 無定形ＳｉＮＣ被膜を蒸着する方法
JPH05502695A (ja) 遷移金属窒化物の化学蒸着方法
JPH03504617A (ja) 基板上への窒化けい素及び二酸化けい素フイルムのプラズマデポジシヨン法
JPS63144525A (ja) 多層セラミック低温形成方法
JPH04153283A (ja) 耐熱性絶縁塗料
DE60000725D1 (de) Mitteltemperatur-cvd-verfahren
US3807008A (en) Chemical vapor deposition coatings on titanium
JP3053224B2 (ja) セラミックス被膜を有する鋼板又は鋼板成形体の製造方法
JP3347287B2 (ja) チタン金属へのガラス状カーボンの被覆方法
JPS60221470A (ja) 硬化皮膜形成剤
JP4705572B2 (ja) 基板上にシリカ被膜を堆積させる方法
US5061514A (en) Chemical vapor deposition (CVD) process for plasma depositing silicon carbide films onto a substrate
JPS6016810A (ja) 表面被覆膜の製造方法
US3783007A (en) Metal carbonitrile coatings
JPH04301084A (ja) 耐摩耗性部材およびその製造法
US4273828A (en) Bulk glass having improved properties
GB955700A (en) Process for the production of coatings of very pure silicon carbide free from bindingagents
JP3993330B2 (ja) ＳｉＯ２系セラミックス膜の形成方法
JPS6054911A (ja) 紫外線カツト膜
Kwatera et al. Preparation of amorphous composites of silicon nitride and carbon layers on silica glass by chemical vapor deposition method
JPH05125660A (ja) 熱分解炭素複合材および高温炉用断熱材
JPS60155675A (ja) 潤滑性のある表面硬化膜の製造方法
JPS60234973A (ja) 窒化けい素薄膜の製造方法