JPS60167332U

JPS60167332U - board boat

Info

Publication number: JPS60167332U
Application number: JP5652884U
Authority: JP
Inventors: 克幸高橋
Original assignee: セイコーインスツルメンツ株式会社
Priority date: 1984-04-17
Filing date: 1984-04-17
Publication date: 1985-11-06

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Brief explanation of drawings]

第１図は従来のボートを用いた時の炉心管内を示す平面
図、第２図は本考案のボーートを示す平面図、第３図ａ
とｂは本考案のボートを用いた時の炉心管内を示す図で
あり、第３図ａは炉心管内の平面図、第３図すは第３図
ａのＡ　−Ａ’線に沿った断面図、第４図は本考案のボ
ートを使用した時のウェハー近傍のガスの流れを示す平
面図、第５図は従来のボートを用いた場合の耐圧分布図
、第６図は本考案のボートを用いた場合の耐圧分布図で
ある。１・・・・・・炉心管、２・・・・・・従来のボート、
３・・曲シリコンウェハー、４・・・・・・炉心管内の
ガスの流れ方向、５・・・・・・ウェハー近傍のガスの
流れ方向、６・・・・・・本考案のボート、７・・四本
考案のボートの溝。Figure 1 is a plan view showing the inside of the reactor core tube when a conventional boat is used, Figure 2 is a plan view showing the boat of the present invention, and Figure 3 a.
and b are views showing the inside of the reactor core tube when the boat of the present invention is used, FIG. 3 a is a plan view of the inside of the reactor core tube, and FIG. Figure 4 is a plan view showing the flow of gas near the wafer when the boat of the present invention is used, Figure 5 is a pressure distribution diagram when a conventional boat is used, and Figure 6 is the boat of the present invention. FIG. 2 is a breakdown voltage distribution diagram when using 1... Furnace tube, 2... Conventional boat,
3...Curved silicon wafer, 4...Direction of gas flow in the reactor tube, 5...Direction of gas flow near the wafer, 6...Boat of the present invention, 7 ...Four designed boat grooves.

Claims

[Scope of utility model registration request]

A substrate boat for arranging semiconductor substrates such as silicon wafers, characterized in that the substrate boat has grooves for installing wafers so that the wafer surface forms an acute angle with respect to the gas flow direction in the reactor core tube. boat.