JPS60160618A - Ｘ線リトグラフイー用のマスクリングアセンブリ - Google Patents

Ｘ線リトグラフイー用のマスクリングアセンブリ

Info

Publication number
JPS60160618A
JPS60160618A JP60000265A JP26585A JPS60160618A JP S60160618 A JPS60160618 A JP S60160618A JP 60000265 A JP60000265 A JP 60000265A JP 26585 A JP26585 A JP 26585A JP S60160618 A JPS60160618 A JP S60160618A
Authority
JP
Japan
Prior art keywords
assembly
mask ring
shaped
mask
ball
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60000265A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0447452B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
ウオレン・デスケノクス
グレゴリイ・ヒユーズ
ジヤステイン・クロイツアー
カルロ・ラ・フイアンドラ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Publication of JPS60160618A publication Critical patent/JPS60160618A/ja
Publication of JPH0447452B2 publication Critical patent/JPH0447452B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60000265A 1984-01-06 1985-01-07 Ｘ線リトグラフイー用のマスクリングアセンブリ Granted JPS60160618A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US568776 1984-01-06
US06/568,776 US4534047A (en) 1984-01-06 1984-01-06 Mask ring assembly for X-ray lithography

Publications (2)

Publication Number Publication Date
JPS60160618A true JPS60160618A (ja) 1985-08-22
JPH0447452B2 JPH0447452B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-08-04

Family

ID=24272694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60000265A Granted JPS60160618A (ja) 1984-01-06 1985-01-07 Ｘ線リトグラフイー用のマスクリングアセンブリ

Country Status (4)

Country Link
US (1) US4534047A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS60160618A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3435019A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2152704B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62151783A (ja) * 1985-12-26 1987-07-06 東芝機械株式会社 高精度移動テ−ブル装置
JPH07307285A (ja) * 1994-03-15 1995-11-21 Canon Inc マスク、マスク支持方法、マスク支持機構、並びにこれを用いた露光装置やデバイス製造方法

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4610020A (en) * 1984-01-06 1986-09-02 The Perkin-Elmer Corporation X-ray mask ring and apparatus for making same
US4758091A (en) * 1986-11-20 1988-07-19 Ateo Corporation Pattern generator part holder
DE4242565C1 (de) * 1992-12-16 1994-03-17 Deutsche Aerospace Verfahren zur Justage von Halbleiterscheiben zueinander
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
JP3244894B2 (ja) * 1993-11-30 2002-01-07 キヤノン株式会社 マスク保持方法、マスク及びマスクチャック、ならびにこれを用いた露光装置とデバイス製造方法
US5863017A (en) * 1996-01-05 1999-01-26 Cymer, Inc. Stabilized laser platform and module interface
US6109574A (en) * 1996-01-05 2000-08-29 Cymer, Inc. Gas laser chamber/optics support structure
JP3243168B2 (ja) * 1996-02-06 2002-01-07 キヤノン株式会社 原版保持装置およびこれを用いた露光装置
US6717159B2 (en) * 2000-10-18 2004-04-06 Nikon Corporation Low distortion kinematic reticle support
US20030098965A1 (en) * 2001-11-29 2003-05-29 Mike Binnard System and method for supporting a device holder with separate components
US20040080730A1 (en) * 2002-10-29 2004-04-29 Michael Binnard System and method for clamping a device holder with reduced deformation
US20060016061A1 (en) * 2004-07-22 2006-01-26 Gad Shelef Kinematic mounting system
US20060232837A1 (en) * 2005-04-19 2006-10-19 Gad Shelef Reduced error kinematic mount
US7173779B2 (en) * 2005-04-19 2007-02-06 Gizmonies, Inc. Kinematic mount having connectors with beveled edges
KR102499977B1 (ko) 2016-07-13 2023-02-15 삼성전자주식회사 접착 테이프 부착 장치 및 이를 이용한 반도체 패키지의 제조 방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB922868A (en) * 1958-10-13 1963-04-03 Leonard David Evans Accurate location systems for repetitive positioning in image reproduction processes
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US3892973A (en) * 1974-02-15 1975-07-01 Bell Telephone Labor Inc Mask structure for X-ray lithography
US4085329A (en) * 1976-05-03 1978-04-18 Hughes Aircraft Company Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment
US4037111A (en) * 1976-06-08 1977-07-19 Bell Telephone Laboratories, Incorporated Mask structures for X-ray lithography
DE2723902C2 (de) * 1977-05-26 1983-12-08 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Parallelausrichtung und Justierung der Lage einer Halbleiterscheibe relativ zu einer Bestrahlungsmaske bei der Röntgenstrahl-Fotolithografie
US4185202A (en) * 1977-12-05 1980-01-22 Bell Telephone Laboratories, Incorporated X-ray lithography
US4215192A (en) * 1978-01-16 1980-07-29 The Perkin-Elmer Corporation X-ray lithography apparatus and method of use
US4238682A (en) * 1979-05-03 1980-12-09 Bell Telephone Laboratories, Incorporated High-power X-ray source
US4301237A (en) * 1979-07-12 1981-11-17 Western Electric Co., Inc. Method for exposing substrates to X-rays
US4335313A (en) * 1980-05-12 1982-06-15 The Perkin-Elmer Corporation Method and apparatus for aligning an opaque mask with an integrated circuit wafer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62151783A (ja) * 1985-12-26 1987-07-06 東芝機械株式会社 高精度移動テ−ブル装置
JPH07307285A (ja) * 1994-03-15 1995-11-21 Canon Inc マスク、マスク支持方法、マスク支持機構、並びにこれを用いた露光装置やデバイス製造方法

Also Published As

Publication number Publication date
DE3435019A1 (de) 1985-07-18
JPH0447452B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-08-04
DE3435019C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-08-26
GB2152704A (en) 1985-08-07
US4534047A (en) 1985-08-06
GB2152704B (en) 1987-04-23
GB8424770D0 (en) 1984-11-07

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