JPS6013164B2 - 電子ビ−ム用レジストの形成方法 - Google Patents
電子ビ−ム用レジストの形成方法Info
- Publication number
- JPS6013164B2 JPS6013164B2 JP52088913A JP8891377A JPS6013164B2 JP S6013164 B2 JPS6013164 B2 JP S6013164B2 JP 52088913 A JP52088913 A JP 52088913A JP 8891377 A JP8891377 A JP 8891377A JP S6013164 B2 JPS6013164 B2 JP S6013164B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- polymer
- resist
- forming resist
- amines
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 title claims description 8
- 238000000034 method Methods 0.000 title claims description 7
- 150000003512 tertiary amines Chemical class 0.000 claims description 11
- 229920001577 copolymer Polymers 0.000 claims description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 5
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 description 8
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 150000008064 anhydrides Chemical class 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 150000003141 primary amines Chemical class 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229940086542 triethylamine Drugs 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 206010007733 Catabolic state Diseases 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- DCUFMVPCXCSVNP-UHFFFAOYSA-N methacrylic anhydride Chemical compound CC(=C)C(=O)OC(=O)C(C)=C DCUFMVPCXCSVNP-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electron Beam Exposure (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/721,259 US4074031A (en) | 1976-09-08 | 1976-09-08 | Process for preparing electron beam resists |
| US721259 | 1976-09-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5334475A JPS5334475A (en) | 1978-03-31 |
| JPS6013164B2 true JPS6013164B2 (ja) | 1985-04-05 |
Family
ID=24897209
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52088913A Expired JPS6013164B2 (ja) | 1976-09-08 | 1977-07-26 | 電子ビ−ム用レジストの形成方法 |
Country Status (7)
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4351925A (en) * | 1980-04-18 | 1982-09-28 | Celanese Corporation | Process for the thermal stabilization of acrylic fibers and films |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3328367A (en) * | 1965-04-29 | 1967-06-27 | Du Pont | Copolymers |
| US3728319A (en) * | 1970-02-19 | 1973-04-17 | Gaf Corp | Reaction products of poly n-vinylpyrrolidone or poly n-vinylpyrrolidones with alkyl side chains and organic secondary or tertiary amines |
-
1976
- 1976-09-08 US US05/721,259 patent/US4074031A/en not_active Expired - Lifetime
-
1977
- 1977-07-13 FR FR7722461A patent/FR2364487A1/fr active Granted
- 1977-07-26 JP JP52088913A patent/JPS6013164B2/ja not_active Expired
- 1977-08-16 DE DE2736756A patent/DE2736756C3/de not_active Expired
- 1977-08-24 GB GB35563/77A patent/GB1530059A/en not_active Expired
- 1977-08-26 IT IT26987/77A patent/IT1114121B/it active
- 1977-09-08 CA CA286,286A patent/CA1078548A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CA1078548A (en) | 1980-05-27 |
| JPS5334475A (en) | 1978-03-31 |
| GB1530059A (en) | 1978-10-25 |
| FR2364487A1 (fr) | 1978-04-07 |
| IT1114121B (it) | 1986-01-27 |
| DE2736756A1 (de) | 1978-03-09 |
| US4074031A (en) | 1978-02-14 |
| FR2364487B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1979-03-09 |
| DE2736756C3 (de) | 1981-02-12 |
| DE2736756B2 (de) | 1980-05-29 |
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