FR2364487A1 - Procede de preparation de materiaux photo-resistants de type positif sensibles a un rayonnement electronique - Google Patents
Procede de preparation de materiaux photo-resistants de type positif sensibles a un rayonnement electroniqueInfo
- Publication number
- FR2364487A1 FR2364487A1 FR7722461A FR7722461A FR2364487A1 FR 2364487 A1 FR2364487 A1 FR 2364487A1 FR 7722461 A FR7722461 A FR 7722461A FR 7722461 A FR7722461 A FR 7722461A FR 2364487 A1 FR2364487 A1 FR 2364487A1
- Authority
- FR
- France
- Prior art keywords
- resistant materials
- electronic radiation
- positive type
- type sensitive
- preparing photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 title abstract 2
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 abstract 3
- 229920001577 copolymer Polymers 0.000 abstract 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- 238000010411 cooking Methods 0.000 abstract 1
- 238000000609 electron-beam lithography Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 150000003512 tertiary amines Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electron Beam Exposure (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/721,259 US4074031A (en) | 1976-09-08 | 1976-09-08 | Process for preparing electron beam resists |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2364487A1 true FR2364487A1 (fr) | 1978-04-07 |
| FR2364487B1 FR2364487B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1979-03-09 |
Family
ID=24897209
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7722461A Granted FR2364487A1 (fr) | 1976-09-08 | 1977-07-13 | Procede de preparation de materiaux photo-resistants de type positif sensibles a un rayonnement electronique |
Country Status (7)
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4351925A (en) * | 1980-04-18 | 1982-09-28 | Celanese Corporation | Process for the thermal stabilization of acrylic fibers and films |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3328367A (en) * | 1965-04-29 | 1967-06-27 | Du Pont | Copolymers |
| US3728319A (en) * | 1970-02-19 | 1973-04-17 | Gaf Corp | Reaction products of poly n-vinylpyrrolidone or poly n-vinylpyrrolidones with alkyl side chains and organic secondary or tertiary amines |
-
1976
- 1976-09-08 US US05/721,259 patent/US4074031A/en not_active Expired - Lifetime
-
1977
- 1977-07-13 FR FR7722461A patent/FR2364487A1/fr active Granted
- 1977-07-26 JP JP52088913A patent/JPS6013164B2/ja not_active Expired
- 1977-08-16 DE DE2736756A patent/DE2736756C3/de not_active Expired
- 1977-08-24 GB GB35563/77A patent/GB1530059A/en not_active Expired
- 1977-08-26 IT IT26987/77A patent/IT1114121B/it active
- 1977-09-08 CA CA286,286A patent/CA1078548A/en not_active Expired
Non-Patent Citations (1)
| Title |
|---|
| NEANT * |
Also Published As
| Publication number | Publication date |
|---|---|
| CA1078548A (en) | 1980-05-27 |
| JPS5334475A (en) | 1978-03-31 |
| GB1530059A (en) | 1978-10-25 |
| IT1114121B (it) | 1986-01-27 |
| DE2736756A1 (de) | 1978-03-09 |
| JPS6013164B2 (ja) | 1985-04-05 |
| US4074031A (en) | 1978-02-14 |
| FR2364487B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1979-03-09 |
| DE2736756C3 (de) | 1981-02-12 |
| DE2736756B2 (de) | 1980-05-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS55118030A (en) | Photopolymerizable composition | |
| FR2434201B1 (fr) | Procede et necessaire de determination et de dosage immunologique d'une substance par creation d'un micro-environnement concentre | |
| ATE2099T1 (de) | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern. | |
| FR2288789A1 (fr) | Procede de traitement de dechets tels que poussieres et calamines provenant de la fabrication d'acier inoxydable | |
| KR900016808A (ko) | 광 경화성 액체 조성물의 연속층으로부터 삼차원 물품을 가공하는 방법 | |
| FR2445360A1 (fr) | Composition chromogenique, son procede de preparation et son application a la production d'un materiel de copiage sensible a la pression | |
| ATE74590T1 (de) | Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare verbindungen und verfahren zu deren herstellung. | |
| US6348296B1 (en) | Copolymer resin, preparation thereof, and photoresist using the same | |
| KR940006195A (ko) | 위상쉬프트층을 갖는 포토마스크의 제조방법 | |
| FR2502382B1 (fr) | Procede de traitement final d'une matiere organique radio-active | |
| FR2364487A1 (fr) | Procede de preparation de materiaux photo-resistants de type positif sensibles a un rayonnement electronique | |
| US3996393A (en) | Positive polymeric electron beam resists of very great sensitivity | |
| US4237208A (en) | Silane electron beam resists | |
| BE849677A (fr) | Composition de matieres a mouler autodurcissante et procede de durcissement a partir d'une telle composition | |
| EP0226741A3 (en) | Process for producing a positive photoresist | |
| EP0195315A3 (en) | Process for the production of photoresist patterns | |
| BR8204007A (pt) | Composicao endurecivel a base de poliester | |
| JPS5524113A (en) | Novel 2-halomethyl-5-vinyl-1,3,4-oxadiazole compound | |
| BE883267A (fr) | Procede pour la fabrication d'une matiere revelatrice de couleur | |
| JPS5639539A (en) | Pattern forming method | |
| JPS5718324A (en) | Method of working | |
| JPS61210332A (ja) | 非線形光学素子用材料及びパタ−ンの形成方法 | |
| OA05992A (fr) | Procédé et installation de fabrication d'acide phosphorique. | |
| JPS57157247A (en) | Optical exposure mask | |
| JPS5737348A (en) | Electron beam sensitive polymer composition |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |