JPS6010247A - 光可溶化組成物 - Google Patents

光可溶化組成物

Info

Publication number
JPS6010247A
JPS6010247A JP58117769A JP11776983A JPS6010247A JP S6010247 A JPS6010247 A JP S6010247A JP 58117769 A JP58117769 A JP 58117769A JP 11776983 A JP11776983 A JP 11776983A JP S6010247 A JPS6010247 A JP S6010247A
Authority
JP
Japan
Prior art keywords
acid
compound
ester group
compounds
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58117769A
Other languages
English (en)
Japanese (ja)
Other versions
JPH047502B2 (forum.php
Inventor
Toshiaki Aoso
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP58117769A priority Critical patent/JPS6010247A/ja
Priority to EP84107587A priority patent/EP0130599B1/en
Priority to DE8484107587T priority patent/DE3473359D1/de
Publication of JPS6010247A publication Critical patent/JPS6010247A/ja
Priority to US07/044,161 priority patent/US4816375A/en
Priority to US07/085,230 priority patent/US4752552A/en
Publication of JPH047502B2 publication Critical patent/JPH047502B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP58117769A 1983-06-29 1983-06-29 光可溶化組成物 Granted JPS6010247A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58117769A JPS6010247A (ja) 1983-06-29 1983-06-29 光可溶化組成物
EP84107587A EP0130599B1 (en) 1983-06-29 1984-06-29 Photosolubilizable composition
DE8484107587T DE3473359D1 (de) 1983-06-29 1984-06-29 Photosolubilizable composition
US07/044,161 US4816375A (en) 1983-06-29 1987-04-30 Photosolubilizable composition with silyl ether or silyl ester compound
US07/085,230 US4752552A (en) 1983-06-29 1987-08-12 Photosolubilizable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58117769A JPS6010247A (ja) 1983-06-29 1983-06-29 光可溶化組成物

Publications (2)

Publication Number Publication Date
JPS6010247A true JPS6010247A (ja) 1985-01-19
JPH047502B2 JPH047502B2 (forum.php) 1992-02-12

Family

ID=14719863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58117769A Granted JPS6010247A (ja) 1983-06-29 1983-06-29 光可溶化組成物

Country Status (1)

Country Link
JP (1) JPS6010247A (forum.php)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS564844U (forum.php) * 1979-06-23 1981-01-17
JPS61167946A (ja) * 1985-01-22 1986-07-29 Fuji Photo Film Co Ltd 着色光可溶化組成物
JPS61169836A (ja) * 1985-01-22 1986-07-31 Fuji Photo Film Co Ltd 光可溶化組成物
JPS6238452A (ja) * 1985-08-14 1987-02-19 Fuji Photo Film Co Ltd 光可溶化組成物
JPS6238451A (ja) * 1985-08-14 1987-02-19 Fuji Photo Film Co Ltd 光可溶化組成物
JPS6240450A (ja) * 1985-08-19 1987-02-21 Fuji Photo Film Co Ltd 光可溶化組成物
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
EP0788031A1 (en) 1996-02-05 1997-08-06 Fuji Photo Film Co., Ltd. Positive working photosensitive composition
US6410204B1 (en) 1999-09-27 2002-06-25 Fuji Photo Film Co., Ltd. Positive photoresist composition
EP1627736A1 (en) 2004-08-18 2006-02-22 Konica Minolta Medical & Graphic, Inc. Method of manufacturing light sensitive planographic printing plates and method of using the same
EP1662318A1 (en) 1999-03-09 2006-05-31 Fuji Photo Film Co., Ltd. 1,3-dihydro-1-oxo-2H-indene derivative
EP1701213A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Photosensitive composition

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS564844U (forum.php) * 1979-06-23 1981-01-17
JPS61167946A (ja) * 1985-01-22 1986-07-29 Fuji Photo Film Co Ltd 着色光可溶化組成物
JPS61169836A (ja) * 1985-01-22 1986-07-31 Fuji Photo Film Co Ltd 光可溶化組成物
JPS6238452A (ja) * 1985-08-14 1987-02-19 Fuji Photo Film Co Ltd 光可溶化組成物
JPS6238451A (ja) * 1985-08-14 1987-02-19 Fuji Photo Film Co Ltd 光可溶化組成物
JPS6240450A (ja) * 1985-08-19 1987-02-21 Fuji Photo Film Co Ltd 光可溶化組成物
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
EP0788031A1 (en) 1996-02-05 1997-08-06 Fuji Photo Film Co., Ltd. Positive working photosensitive composition
EP1662318A1 (en) 1999-03-09 2006-05-31 Fuji Photo Film Co., Ltd. 1,3-dihydro-1-oxo-2H-indene derivative
US6410204B1 (en) 1999-09-27 2002-06-25 Fuji Photo Film Co., Ltd. Positive photoresist composition
EP1627736A1 (en) 2004-08-18 2006-02-22 Konica Minolta Medical & Graphic, Inc. Method of manufacturing light sensitive planographic printing plates and method of using the same
EP1701213A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Photosensitive composition

Also Published As

Publication number Publication date
JPH047502B2 (forum.php) 1992-02-12

Similar Documents

Publication Publication Date Title
US4816375A (en) Photosolubilizable composition with silyl ether or silyl ester compound
JP2525568B2 (ja) 光可溶化組成物
JP2839678B2 (ja) 陽画処理照射感応性混合物およびそれから製造した照射感応性複写材料
JPH04365048A (ja) 感光性組成物
JPS6037549A (ja) 光可溶化組成物
JPH04365049A (ja) 感光性組成物
JPS6010247A (ja) 光可溶化組成物
US4786577A (en) Photo-solubilizable composition admixture with radiation sensitive acid producing compound and silyl ether group containing compound with either urethane, ureido, amido, or ester group
JP2599007B2 (ja) ポジ型感光性組成物
JPS60121446A (ja) 光可溶化組成物
JPS603625A (ja) 光可溶化組成物
JPH02100055A (ja) ポジ型感光性組成物
JPH0515257B2 (forum.php)
JPH048783B2 (forum.php)
JPS6238450A (ja) 光可溶化組成物
JP2704319B2 (ja) 感光性組成物
JPH05100429A (ja) 感光性組成物
JPS61167945A (ja) 光可溶化組成物
JPS6238453A (ja) 光可溶化組成物
JPS6238452A (ja) 光可溶化組成物
JPS61166543A (ja) 光可溶化組成物
JPS6238451A (ja) 光可溶化組成物
JPS63236028A (ja) 光可溶化組成物
JPH04362647A (ja) 感光性組成物
JPS6261047A (ja) 感光性組成物