JPS5999721A - マーク検出装置 - Google Patents

マーク検出装置

Info

Publication number
JPS5999721A
JPS5999721A JP57208764A JP20876482A JPS5999721A JP S5999721 A JPS5999721 A JP S5999721A JP 57208764 A JP57208764 A JP 57208764A JP 20876482 A JP20876482 A JP 20876482A JP S5999721 A JPS5999721 A JP S5999721A
Authority
JP
Japan
Prior art keywords
light
beams
reflected
deflected
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57208764A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0117245B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Shigeki Nakano
茂樹 中野
Masao Totsuka
戸塚　正雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP57208764A priority Critical patent/JPS5999721A/ja
Priority to US06/554,630 priority patent/US4611122A/en
Publication of JPS5999721A publication Critical patent/JPS5999721A/ja
Publication of JPH0117245B2 publication Critical patent/JPH0117245B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP57208764A 1982-11-29 1982-11-29 マーク検出装置 Granted JPS5999721A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57208764A JPS5999721A (ja) 1982-11-29 1982-11-29 マーク検出装置
US06/554,630 US4611122A (en) 1982-11-29 1983-11-23 Signal detection apparatus with plural elongate beams corresponding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57208764A JPS5999721A (ja) 1982-11-29 1982-11-29 マーク検出装置

Publications (2)

Publication Number Publication Date
JPS5999721A true JPS5999721A (ja) 1984-06-08
JPH0117245B2 JPH0117245B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-03-29

Family

ID=16561697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57208764A Granted JPS5999721A (ja) 1982-11-29 1982-11-29 マーク検出装置

Country Status (2)

Country Link
US (1) US4611122A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5999721A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009188404A (ja) * 2008-02-01 2009-08-20 Asml Netherlands Bv アラインメントマーク及びこのようなアラインメントマークを備える基板の位置合わせ方法
KR20190095318A (ko) 2016-12-28 2019-08-14 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 금속-섬유 강화 수지 재료 복합체, 그의 제조 방법 및 접착 시트

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801808A (en) * 1984-07-27 1989-01-31 Canon Kabushiki Kaisha Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system
US4937459A (en) * 1984-11-16 1990-06-26 Canon Kabushiki Kaisha Alignment signal detecting device
JPH0726803B2 (ja) * 1984-11-26 1995-03-29 株式会社ニコン 位置検出方法及び装置
DE3542514A1 (de) * 1985-12-02 1987-06-04 Zeiss Carl Fa Wegmesseinrichtung
JPH0267903A (ja) * 1988-09-02 1990-03-07 Canon Inc 光量調節装置
JP3093337B2 (ja) * 1991-07-15 2000-10-03 キヤノン株式会社 走査光学装置
KR960024689A (ko) * 1994-12-01 1996-07-20 오노 시게오 광학 장치
CN108508713B (zh) * 2017-02-28 2020-04-10 上海微电子装备（集团）股份有限公司 一种掩模传输预对准装置及方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3683195A (en) * 1971-03-22 1972-08-08 Kasper Instruments Apparatus for the automatic alignment of two superimposed objects,e.g. a semiconductor wafer and mask
US3865483A (en) * 1974-03-21 1975-02-11 Ibm Alignment illumination system
JPS5952535B2 (ja) * 1977-01-21 1984-12-20 キヤノン株式会社 光学装置
JPS53135654A (en) * 1977-05-01 1978-11-27 Canon Inc Photoelectric detecting device
JPS5534490A (en) * 1978-09-01 1980-03-11 Canon Inc Alignment device
JPS5852825A (ja) * 1981-09-24 1983-03-29 Canon Inc 位置合わせ信号処理装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009188404A (ja) * 2008-02-01 2009-08-20 Asml Netherlands Bv アラインメントマーク及びこのようなアラインメントマークを備える基板の位置合わせ方法
US8208121B2 (en) 2008-02-01 2012-06-26 Asml Netherlands B.V. Alignment mark and a method of aligning a substrate comprising such an alignment mark
KR20190095318A (ko) 2016-12-28 2019-08-14 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 금속-섬유 강화 수지 재료 복합체, 그의 제조 방법 및 접착 시트

Also Published As

Publication number Publication date
JPH0117245B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-03-29
US4611122A (en) 1986-09-09

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