JPS5999720A - レジスト像形成方法 - Google Patents

レジスト像形成方法

Info

Publication number
JPS5999720A
JPS5999720A JP20847182A JP20847182A JPS5999720A JP S5999720 A JPS5999720 A JP S5999720A JP 20847182 A JP20847182 A JP 20847182A JP 20847182 A JP20847182 A JP 20847182A JP S5999720 A JPS5999720 A JP S5999720A
Authority
JP
Japan
Prior art keywords
resist
rinsing
chloroacrylate
stage
ipa
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20847182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0356469B2 (cs
Inventor
Tsukasa Tada
宰 多田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP20847182A priority Critical patent/JPS5999720A/ja
Publication of JPS5999720A publication Critical patent/JPS5999720A/ja
Publication of JPH0356469B2 publication Critical patent/JPH0356469B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP20847182A 1982-11-30 1982-11-30 レジスト像形成方法 Granted JPS5999720A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20847182A JPS5999720A (ja) 1982-11-30 1982-11-30 レジスト像形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20847182A JPS5999720A (ja) 1982-11-30 1982-11-30 レジスト像形成方法

Publications (2)

Publication Number Publication Date
JPS5999720A true JPS5999720A (ja) 1984-06-08
JPH0356469B2 JPH0356469B2 (cs) 1991-08-28

Family

ID=16556720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20847182A Granted JPS5999720A (ja) 1982-11-30 1982-11-30 レジスト像形成方法

Country Status (1)

Country Link
JP (1) JPS5999720A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5403699A (en) * 1989-10-19 1995-04-04 Fujitsu Limited Process for formation of resist patterns
JP2007191399A (ja) * 2006-01-17 2007-08-02 Arakawa Chem Ind Co Ltd 脂環式化合物およびその製造方法
WO2016208313A1 (ja) * 2015-06-23 2016-12-29 富士フイルム株式会社 現像液、パターン形成方法、及び電子デバイスの製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5403699A (en) * 1989-10-19 1995-04-04 Fujitsu Limited Process for formation of resist patterns
JP2007191399A (ja) * 2006-01-17 2007-08-02 Arakawa Chem Ind Co Ltd 脂環式化合物およびその製造方法
WO2016208313A1 (ja) * 2015-06-23 2016-12-29 富士フイルム株式会社 現像液、パターン形成方法、及び電子デバイスの製造方法
JPWO2016208313A1 (ja) * 2015-06-23 2018-04-12 富士フイルム株式会社 パターン形成方法、及び電子デバイスの製造方法
US10562991B2 (en) 2015-06-23 2020-02-18 Fujifilm Corporation Developer, pattern forming method, and electronic device manufacturing method

Also Published As

Publication number Publication date
JPH0356469B2 (cs) 1991-08-28

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