JPS5991718A - 電磁遅延線 - Google Patents
電磁遅延線Info
- Publication number
- JPS5991718A JPS5991718A JP20082482A JP20082482A JPS5991718A JP S5991718 A JPS5991718 A JP S5991718A JP 20082482 A JP20082482 A JP 20082482A JP 20082482 A JP20082482 A JP 20082482A JP S5991718 A JPS5991718 A JP S5991718A
- Authority
- JP
- Japan
- Prior art keywords
- coil
- delay line
- coils
- winding
- inductance element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004804 winding Methods 0.000 claims abstract description 37
- 230000008878 coupling Effects 0.000 abstract description 30
- 238000010168 coupling process Methods 0.000 abstract description 30
- 238000005859 coupling reaction Methods 0.000 abstract description 30
- 239000003990 capacitor Substances 0.000 abstract description 7
- 239000004020 conductor Substances 0.000 description 17
- 238000010586 diagram Methods 0.000 description 5
- 239000000696 magnetic material Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/30—Time-delay networks
- H03H7/32—Time-delay networks with lumped inductance and capacitance
Landscapes
- Coils Or Transformers For Communication (AREA)
- Filters And Equalizers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20082482A JPS5991718A (ja) | 1982-11-16 | 1982-11-16 | 電磁遅延線 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20082482A JPS5991718A (ja) | 1982-11-16 | 1982-11-16 | 電磁遅延線 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5991718A true JPS5991718A (ja) | 1984-05-26 |
| JPH0218613B2 JPH0218613B2 (enrdf_load_stackoverflow) | 1990-04-26 |
Family
ID=16430810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20082482A Granted JPS5991718A (ja) | 1982-11-16 | 1982-11-16 | 電磁遅延線 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5991718A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6784050B1 (en) | 2000-09-05 | 2004-08-31 | Marvell International Ltd. | Fringing capacitor structure |
| US6974744B1 (en) | 2000-09-05 | 2005-12-13 | Marvell International Ltd. | Fringing capacitor structure |
| US6980414B1 (en) | 2004-06-16 | 2005-12-27 | Marvell International, Ltd. | Capacitor structure in a semiconductor device |
| US7906424B2 (en) | 2007-08-01 | 2011-03-15 | Advanced Micro Devices, Inc. | Conductor bump method and apparatus |
| US8314474B2 (en) | 2008-07-25 | 2012-11-20 | Ati Technologies Ulc | Under bump metallization for on-die capacitor |
-
1982
- 1982-11-16 JP JP20082482A patent/JPS5991718A/ja active Granted
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6784050B1 (en) | 2000-09-05 | 2004-08-31 | Marvell International Ltd. | Fringing capacitor structure |
| US6885543B1 (en) | 2000-09-05 | 2005-04-26 | Marvell International, Ltd. | Fringing capacitor structure |
| US6974744B1 (en) | 2000-09-05 | 2005-12-13 | Marvell International Ltd. | Fringing capacitor structure |
| US9017427B1 (en) | 2001-01-18 | 2015-04-28 | Marvell International Ltd. | Method of creating capacitor structure in a semiconductor device |
| US6980414B1 (en) | 2004-06-16 | 2005-12-27 | Marvell International, Ltd. | Capacitor structure in a semiconductor device |
| US7116544B1 (en) | 2004-06-16 | 2006-10-03 | Marvell International, Ltd. | Capacitor structure in a semiconductor device |
| US7578858B1 (en) | 2004-06-16 | 2009-08-25 | Marvell International Ltd. | Making capacitor structure in a semiconductor device |
| US7988744B1 (en) | 2004-06-16 | 2011-08-02 | Marvell International Ltd. | Method of producing capacitor structure in a semiconductor device |
| US8537524B1 (en) | 2004-06-16 | 2013-09-17 | Marvell International Ltd. | Capacitor structure in a semiconductor device |
| US7906424B2 (en) | 2007-08-01 | 2011-03-15 | Advanced Micro Devices, Inc. | Conductor bump method and apparatus |
| US8314474B2 (en) | 2008-07-25 | 2012-11-20 | Ati Technologies Ulc | Under bump metallization for on-die capacitor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0218613B2 (enrdf_load_stackoverflow) | 1990-04-26 |
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