JPS5990219A - 磁気ヘツド - Google Patents
磁気ヘツドInfo
- Publication number
- JPS5990219A JPS5990219A JP19932582A JP19932582A JPS5990219A JP S5990219 A JPS5990219 A JP S5990219A JP 19932582 A JP19932582 A JP 19932582A JP 19932582 A JP19932582 A JP 19932582A JP S5990219 A JPS5990219 A JP S5990219A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- amorphous
- thin film
- combination
- films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 claims abstract description 17
- 239000010409 thin film Substances 0.000 claims abstract description 17
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 7
- 239000010408 film Substances 0.000 claims abstract description 5
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 4
- 238000007496 glass forming Methods 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 7
- 238000005299 abrasion Methods 0.000 abstract description 4
- 238000004544 sputter deposition Methods 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910000808 amorphous metal alloy Inorganic materials 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000007792 addition Methods 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000004804 winding Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000006247 magnetic powder Substances 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 229910020641 Co Zr Inorganic materials 0.000 description 1
- 229910020520 Co—Zr Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 210000001015 abdomen Anatomy 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 210000000845 cartilage Anatomy 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000023597 hemostasis Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 229940098465 tincture Drugs 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
- G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19932582A JPS5990219A (ja) | 1982-11-12 | 1982-11-12 | 磁気ヘツド |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19932582A JPS5990219A (ja) | 1982-11-12 | 1982-11-12 | 磁気ヘツド |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5990219A true JPS5990219A (ja) | 1984-05-24 |
| JPS6314406B2 JPS6314406B2 (enrdf_load_stackoverflow) | 1988-03-30 |
Family
ID=16405915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19932582A Granted JPS5990219A (ja) | 1982-11-12 | 1982-11-12 | 磁気ヘツド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5990219A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6195503A (ja) * | 1984-10-16 | 1986-05-14 | Sony Corp | 非晶質軟磁性薄膜 |
| JPS61188908A (ja) * | 1985-02-16 | 1986-08-22 | Sony Corp | 非晶質軟磁性薄膜 |
| WO2014126143A1 (ja) * | 2013-02-18 | 2014-08-21 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅ系合金およびスパッタリングターゲット材 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5684439A (en) * | 1979-12-13 | 1981-07-09 | Takeshi Masumoto | Cobalt based amorphous alloy having small magnetic strain and high permeability |
| JPS58177432A (ja) * | 1982-04-13 | 1983-10-18 | Matsushita Electric Ind Co Ltd | 非晶質磁性合金 |
-
1982
- 1982-11-12 JP JP19932582A patent/JPS5990219A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5684439A (en) * | 1979-12-13 | 1981-07-09 | Takeshi Masumoto | Cobalt based amorphous alloy having small magnetic strain and high permeability |
| JPS58177432A (ja) * | 1982-04-13 | 1983-10-18 | Matsushita Electric Ind Co Ltd | 非晶質磁性合金 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6195503A (ja) * | 1984-10-16 | 1986-05-14 | Sony Corp | 非晶質軟磁性薄膜 |
| JPS61188908A (ja) * | 1985-02-16 | 1986-08-22 | Sony Corp | 非晶質軟磁性薄膜 |
| WO2014126143A1 (ja) * | 2013-02-18 | 2014-08-21 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅ系合金およびスパッタリングターゲット材 |
| CN105074041A (zh) * | 2013-02-18 | 2015-11-18 | 山阳特殊制钢株式会社 | 用于垂直磁性记录介质中的软磁性膜层的CoFe系合金和溅射靶材 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6314406B2 (enrdf_load_stackoverflow) | 1988-03-30 |
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