JPS5969931A - ポリイミドを遠紫外線で食刻する方法 - Google Patents

ポリイミドを遠紫外線で食刻する方法

Info

Publication number
JPS5969931A
JPS5969931A JP58112988A JP11298883A JPS5969931A JP S5969931 A JPS5969931 A JP S5969931A JP 58112988 A JP58112988 A JP 58112988A JP 11298883 A JP11298883 A JP 11298883A JP S5969931 A JPS5969931 A JP S5969931A
Authority
JP
Japan
Prior art keywords
polyimide
etching
ultraviolet light
laser
photoetching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58112988A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0566010B2 (cg-RX-API-DMAC7.html
Inventor
サミユエル・エミ−ル・ブラム
カレン・リン・ハロウエイ
ランガスワミイ・スリニバサン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5969931A publication Critical patent/JPS5969931A/ja
Publication of JPH0566010B2 publication Critical patent/JPH0566010B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Drying Of Semiconductors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP58112988A 1982-10-07 1983-06-24 ポリイミドを遠紫外線で食刻する方法 Granted JPS5969931A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43330382A 1982-10-07 1982-10-07
US433303 1982-10-07

Publications (2)

Publication Number Publication Date
JPS5969931A true JPS5969931A (ja) 1984-04-20
JPH0566010B2 JPH0566010B2 (cg-RX-API-DMAC7.html) 1993-09-20

Family

ID=23719664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58112988A Granted JPS5969931A (ja) 1982-10-07 1983-06-24 ポリイミドを遠紫外線で食刻する方法

Country Status (3)

Country Link
EP (1) EP0108189B1 (cg-RX-API-DMAC7.html)
JP (1) JPS5969931A (cg-RX-API-DMAC7.html)
DE (1) DE3376889D1 (cg-RX-API-DMAC7.html)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068618A (ja) * 1983-09-26 1985-04-19 Fujitsu Ltd 半導体装置の製造方法
JPS60236248A (ja) * 1984-05-09 1985-11-25 Matsushita Electric Ind Co Ltd 多層配線形成方法
JPS61152018A (ja) * 1984-12-25 1986-07-10 Toshiba Corp 有機物の灰化方法
JPH02127440A (ja) * 1988-11-07 1990-05-16 Agency Of Ind Science & Technol 非晶性プラスチック成形品の光加工法
JPH0352936A (ja) * 1989-07-19 1991-03-07 Nitto Denko Corp 表面改質方法
WO2023100387A1 (ja) * 2021-11-30 2023-06-08 ウシオ電機株式会社 表面改質方法、樹脂めっき材の製造方法、及び無電解めっき装置
JP2023080489A (ja) * 2021-11-30 2023-06-09 ウシオ電機株式会社 表面改質方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4904328A (en) * 1987-09-08 1990-02-27 Gencorp Inc. Bonding of FRP parts
EP0379639A3 (en) * 1988-09-26 1991-02-06 International Business Machines Corporation Electron beam-positive polyimide
US4877718A (en) * 1988-09-26 1989-10-31 Rennsselaer Polytechnic Institute Positive-working photosensitive polyimide operated by photo induced molecular weight changes
GB2227701B (en) * 1989-02-07 1993-01-06 Stc Plc Selective etching process
US5178726A (en) * 1991-03-07 1993-01-12 Minnesota Mining And Manufacturing Company Process for producing a patterned metal surface
CA2084451A1 (en) * 1992-02-18 1993-08-19 Cameron T. Murray Polyimide surfaces having enhanced adhesion

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2450535A1 (de) * 1974-10-24 1976-04-29 Crosfield Electronics Ltd Druckplatte sowie verfahren und vorrichtung zur herstellung derselben
JPS57198631A (en) * 1981-05-29 1982-12-06 Ibm Exposing method and device

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
APPL.PHYS,LETT=1982 *
J.APPL.PHYS.=1982 *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068618A (ja) * 1983-09-26 1985-04-19 Fujitsu Ltd 半導体装置の製造方法
JPS60236248A (ja) * 1984-05-09 1985-11-25 Matsushita Electric Ind Co Ltd 多層配線形成方法
JPS61152018A (ja) * 1984-12-25 1986-07-10 Toshiba Corp 有機物の灰化方法
JPH02127440A (ja) * 1988-11-07 1990-05-16 Agency Of Ind Science & Technol 非晶性プラスチック成形品の光加工法
JPH0352936A (ja) * 1989-07-19 1991-03-07 Nitto Denko Corp 表面改質方法
WO2023100387A1 (ja) * 2021-11-30 2023-06-08 ウシオ電機株式会社 表面改質方法、樹脂めっき材の製造方法、及び無電解めっき装置
JP2023080489A (ja) * 2021-11-30 2023-06-09 ウシオ電機株式会社 表面改質方法

Also Published As

Publication number Publication date
DE3376889D1 (en) 1988-07-07
EP0108189A3 (en) 1984-07-04
EP0108189A2 (en) 1984-05-16
JPH0566010B2 (cg-RX-API-DMAC7.html) 1993-09-20
EP0108189B1 (en) 1988-06-01

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