DE3376889D1 - A method for etching polyimides - Google Patents

A method for etching polyimides

Info

Publication number
DE3376889D1
DE3376889D1 DE8383105700T DE3376889T DE3376889D1 DE 3376889 D1 DE3376889 D1 DE 3376889D1 DE 8383105700 T DE8383105700 T DE 8383105700T DE 3376889 T DE3376889 T DE 3376889T DE 3376889 D1 DE3376889 D1 DE 3376889D1
Authority
DE
Germany
Prior art keywords
etching polyimides
polyimides
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383105700T
Other languages
German (de)
English (en)
Inventor
Samuel Emil Blum
Karen Lynne Holloway
Rangaswamy Srinivasan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3376889D1 publication Critical patent/DE3376889D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Drying Of Semiconductors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
DE8383105700T 1982-10-07 1983-06-10 A method for etching polyimides Expired DE3376889D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US43330382A 1982-10-07 1982-10-07

Publications (1)

Publication Number Publication Date
DE3376889D1 true DE3376889D1 (en) 1988-07-07

Family

ID=23719664

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383105700T Expired DE3376889D1 (en) 1982-10-07 1983-06-10 A method for etching polyimides

Country Status (3)

Country Link
EP (1) EP0108189B1 (cg-RX-API-DMAC7.html)
JP (1) JPS5969931A (cg-RX-API-DMAC7.html)
DE (1) DE3376889D1 (cg-RX-API-DMAC7.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068618A (ja) * 1983-09-26 1985-04-19 Fujitsu Ltd 半導体装置の製造方法
JPS60236248A (ja) * 1984-05-09 1985-11-25 Matsushita Electric Ind Co Ltd 多層配線形成方法
JPH0727887B2 (ja) * 1984-12-25 1995-03-29 株式会社東芝 有機物の灰化方法
US4904328A (en) * 1987-09-08 1990-02-27 Gencorp Inc. Bonding of FRP parts
JP2555167B2 (ja) * 1988-11-07 1996-11-20 工業技術院長 非晶性プラスチック成形品の光加工法
EP0379639A3 (en) * 1988-09-26 1991-02-06 International Business Machines Corporation Electron beam-positive polyimide
US4877718A (en) * 1988-09-26 1989-10-31 Rennsselaer Polytechnic Institute Positive-working photosensitive polyimide operated by photo induced molecular weight changes
GB2227701B (en) * 1989-02-07 1993-01-06 Stc Plc Selective etching process
JPH0352936A (ja) * 1989-07-19 1991-03-07 Nitto Denko Corp 表面改質方法
US5178726A (en) * 1991-03-07 1993-01-12 Minnesota Mining And Manufacturing Company Process for producing a patterned metal surface
CA2084451A1 (en) * 1992-02-18 1993-08-19 Cameron T. Murray Polyimide surfaces having enhanced adhesion
WO2023100387A1 (ja) * 2021-11-30 2023-06-08 ウシオ電機株式会社 表面改質方法、樹脂めっき材の製造方法、及び無電解めっき装置
JP2023080489A (ja) * 2021-11-30 2023-06-09 ウシオ電機株式会社 表面改質方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2450535A1 (de) * 1974-10-24 1976-04-29 Crosfield Electronics Ltd Druckplatte sowie verfahren und vorrichtung zur herstellung derselben
JPS57198631A (en) * 1981-05-29 1982-12-06 Ibm Exposing method and device

Also Published As

Publication number Publication date
JPS5969931A (ja) 1984-04-20
EP0108189A3 (en) 1984-07-04
EP0108189A2 (en) 1984-05-16
JPH0566010B2 (cg-RX-API-DMAC7.html) 1993-09-20
EP0108189B1 (en) 1988-06-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee