JPS5968735A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS5968735A
JPS5968735A JP17932682A JP17932682A JPS5968735A JP S5968735 A JPS5968735 A JP S5968735A JP 17932682 A JP17932682 A JP 17932682A JP 17932682 A JP17932682 A JP 17932682A JP S5968735 A JPS5968735 A JP S5968735A
Authority
JP
Japan
Prior art keywords
photoresist
mask
polymer
photosensitive composition
poly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17932682A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0544665B2 (sk
Inventor
Yoichi Nakamura
洋一 中村
Akihiro Shimizu
昭宏 清水
Hiroyoshi Saito
斎藤　弘義
Cho Yamamoto
山本　兆
Akira Yokota
晃 横田
Hisashi Nakane
中根　久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP17932682A priority Critical patent/JPS5968735A/ja
Priority to DE19833337303 priority patent/DE3337303C2/de
Publication of JPS5968735A publication Critical patent/JPS5968735A/ja
Publication of JPH0544665B2 publication Critical patent/JPH0544665B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP17932682A 1982-10-13 1982-10-13 感光性組成物 Granted JPS5968735A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP17932682A JPS5968735A (ja) 1982-10-13 1982-10-13 感光性組成物
DE19833337303 DE3337303C2 (de) 1982-10-13 1983-10-13 Verfahren zur photolithographischen Erzeugung von feinen Resistmustern und hierfür verwendbare lichtempfindliche Gemische

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17932682A JPS5968735A (ja) 1982-10-13 1982-10-13 感光性組成物

Publications (2)

Publication Number Publication Date
JPS5968735A true JPS5968735A (ja) 1984-04-18
JPH0544665B2 JPH0544665B2 (sk) 1993-07-07

Family

ID=16063877

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17932682A Granted JPS5968735A (ja) 1982-10-13 1982-10-13 感光性組成物

Country Status (2)

Country Link
JP (1) JPS5968735A (sk)
DE (1) DE3337303C2 (sk)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61289345A (ja) * 1985-05-31 1986-12-19 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション リソグラフイ用レジスト
JPS63291053A (ja) * 1987-05-25 1988-11-28 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
US5378585A (en) * 1990-06-25 1995-01-03 Matsushita Electronics Corporation Resist composition having a siloxane-bond structure

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3669211D1 (de) * 1985-05-31 1990-04-05 Ibm Schutzlack fuer lithographie und anwendungsverfahren.
JPH0772799B2 (ja) * 1986-08-13 1995-08-02 ソニー株式会社 レジスト材料
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
DE4228790C1 (de) 1992-08-29 1993-11-25 Du Pont Deutschland Tonbares strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Mehrfarbenbildern mittels solch eines Gemischs

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137202A (sk) * 1974-04-22 1975-10-31
JPS516561A (sk) * 1974-07-04 1976-01-20 Yamamoto Kagaku Gosei Kk

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5525418B2 (sk) * 1972-12-20 1980-07-05
US4200463A (en) * 1975-12-19 1980-04-29 Motorola, Inc. Semiconductor device manufacture using photoresist protective coating
DE3022473A1 (de) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137202A (sk) * 1974-04-22 1975-10-31
JPS516561A (sk) * 1974-07-04 1976-01-20 Yamamoto Kagaku Gosei Kk

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61289345A (ja) * 1985-05-31 1986-12-19 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション リソグラフイ用レジスト
JPS63291053A (ja) * 1987-05-25 1988-11-28 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
US5378585A (en) * 1990-06-25 1995-01-03 Matsushita Electronics Corporation Resist composition having a siloxane-bond structure
US5547808A (en) * 1990-06-25 1996-08-20 Matsushita Electronics Corporation Resist composition having a siloxane-bond structure
US5554465A (en) * 1990-06-25 1996-09-10 Matsushita Electronics Corporation Process for forming a pattern using a resist composition having a siloxane-bond structure

Also Published As

Publication number Publication date
JPH0544665B2 (sk) 1993-07-07
DE3337303C2 (de) 1987-03-26
DE3337303A1 (de) 1984-04-19

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