JPS5961132A - 電子ビ−ム露光装置 - Google Patents

電子ビ−ム露光装置

Info

Publication number
JPS5961132A
JPS5961132A JP57171243A JP17124382A JPS5961132A JP S5961132 A JPS5961132 A JP S5961132A JP 57171243 A JP57171243 A JP 57171243A JP 17124382 A JP17124382 A JP 17124382A JP S5961132 A JPS5961132 A JP S5961132A
Authority
JP
Japan
Prior art keywords
stage
electron beam
chamber
moved
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57171243A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0328814B2 (OSRAM
Inventor
Kenji Sugishima
賢次 杉島
Hiroshi Yasuda
洋 安田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57171243A priority Critical patent/JPS5961132A/ja
Priority to EP83305968A priority patent/EP0107414B1/en
Priority to DE8383305968T priority patent/DE3371011D1/de
Publication of JPS5961132A publication Critical patent/JPS5961132A/ja
Priority to US06/824,930 priority patent/US4684315A/en
Publication of JPH0328814B2 publication Critical patent/JPH0328814B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/0408—Passive magnetic bearings
    • F16C32/0423—Passive magnetic bearings with permanent magnets on both parts repelling each other
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/0408—Passive magnetic bearings
    • F16C32/0423—Passive magnetic bearings with permanent magnets on both parts repelling each other
    • F16C32/0434—Passive magnetic bearings with permanent magnets on both parts repelling each other for parts moving linearly
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57171243A 1982-09-30 1982-09-30 電子ビ−ム露光装置 Granted JPS5961132A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57171243A JPS5961132A (ja) 1982-09-30 1982-09-30 電子ビ−ム露光装置
EP83305968A EP0107414B1 (en) 1982-09-30 1983-09-30 Frictionless supporting apparatus
DE8383305968T DE3371011D1 (en) 1982-09-30 1983-09-30 Frictionless supporting apparatus
US06/824,930 US4684315A (en) 1982-09-30 1986-01-31 Frictionless supporting apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57171243A JPS5961132A (ja) 1982-09-30 1982-09-30 電子ビ−ム露光装置

Publications (2)

Publication Number Publication Date
JPS5961132A true JPS5961132A (ja) 1984-04-07
JPH0328814B2 JPH0328814B2 (OSRAM) 1991-04-22

Family

ID=15919691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57171243A Granted JPS5961132A (ja) 1982-09-30 1982-09-30 電子ビ−ム露光装置

Country Status (4)

Country Link
US (1) US4684315A (OSRAM)
EP (1) EP0107414B1 (OSRAM)
JP (1) JPS5961132A (OSRAM)
DE (1) DE3371011D1 (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08203800A (ja) * 1995-01-23 1996-08-09 Toshiba Mach Co Ltd 試料ホルダの固定装置
JP2001308161A (ja) * 2000-04-25 2001-11-02 Kyocera Corp 真空用ステ−ジ機構
JP2001332181A (ja) * 2000-03-16 2001-11-30 Applied Materials Inc イオン抽出アセンブリ
JP2007310302A (ja) * 2006-05-22 2007-11-29 Pentax Corp 移動ユニット支持装置

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8701139A (nl) * 1987-05-13 1988-12-01 Philips Nv Geleideinrichting.
US4748738A (en) * 1987-07-21 1988-06-07 Magnetic Peripherals Inc. High strength magnet-pole piece assembly tool
NL8803101A (nl) * 1988-12-19 1990-07-16 Philips Nv Objecthouder voor positionering van een object in een stralenbundel.
US4987526A (en) * 1989-02-02 1991-01-22 Massachusetts Institute Of Technology System to provide high speed, high accuracy motion
NL8902471A (nl) * 1989-10-05 1991-05-01 Philips Nv Tweetraps positioneerinrichting.
US5323012A (en) * 1991-08-16 1994-06-21 The Regents Of The University Of California Apparatus for positioning a stage
US6989647B1 (en) * 1994-04-01 2006-01-24 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US7365513B1 (en) 1994-04-01 2008-04-29 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5874820A (en) 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
JPH07318842A (ja) * 1994-05-24 1995-12-08 Canon Inc 走査光学装置
US6246204B1 (en) * 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
US6008500A (en) * 1995-04-04 1999-12-28 Nikon Corporation Exposure apparatus having dynamically isolated reaction frame
TW318255B (OSRAM) 1995-05-30 1997-10-21 Philips Electronics Nv
JPH08323567A (ja) * 1995-05-31 1996-12-10 Ntn Corp Ｘｙテーブル
US5760564A (en) * 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
DE19628921C2 (de) * 1995-10-02 2000-02-24 Wiemers Karl Heinz Werkzeugmaschine mit mittels Magnetkräften spann- und positionierbarer Spanneinrichtung
US5862583A (en) * 1995-12-28 1999-01-26 Lucent Technologies Inc. Panel positioning method and apparatus
JP4354039B2 (ja) * 1999-04-02 2009-10-28 東京エレクトロン株式会社 駆動装置
US6781138B2 (en) 2001-05-30 2004-08-24 Nikon Corp. Positioning stage with stationary actuators
US6903346B2 (en) * 2001-07-11 2005-06-07 Nikon Corporation Stage assembly having a follower assembly
JP4323759B2 (ja) * 2002-05-27 2009-09-02 キヤノン株式会社 露光装置およびデバイス製造方法
JP4143438B2 (ja) * 2003-02-24 2008-09-03 キヤノン株式会社 支持装置、露光装置、デバイス製造方法
JP2005142501A (ja) * 2003-11-10 2005-06-02 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
US7869000B2 (en) * 2004-11-02 2011-01-11 Nikon Corporation Stage assembly with lightweight fine stage and low transmissibility
US7417714B2 (en) * 2004-11-02 2008-08-26 Nikon Corporation Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
KR101288457B1 (ko) * 2011-11-08 2013-07-26 주식회사 탑 엔지니어링 어레이 테스트 장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56125984A (en) * 1980-03-10 1981-10-02 Nippon Telegr & Teleph Corp <Ntt> Magnetically floating movable base

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2916279A (en) * 1956-03-19 1959-12-08 Austin N Stanton Acceleration and velocity detection devices and systems
DE1477579C3 (de) * 1960-09-13 1974-01-03 Hellmut Dipl.-Ing. 7300 Esslingen-Liebersbronn Mueller Vorrichtung zum Bearbeiten von Werkstücken
US3441331A (en) * 1967-10-23 1969-04-29 Gen Motors Corp Gliding shelf
US3493274A (en) * 1967-12-18 1970-02-03 Little Inc A Magnetic support systems
NL7315725A (OSRAM) * 1972-12-30 1974-07-02
NL7307042A (OSRAM) * 1973-05-21 1974-11-25
DE2515181A1 (de) * 1975-04-08 1976-11-04 Krupp Gmbh Dauermagnetanordnung zum tragen spurgebundener verkehrsmittel
JPS5313272A (en) * 1976-07-23 1978-02-06 Hitachi Ltd Precision planar moving plate
US4273054A (en) * 1977-01-18 1981-06-16 Japanese National Railways Vehicle vibration damping method in the induced repulsion type magnetically suspended railway vehicle
FR2379732A1 (fr) * 1977-02-04 1978-09-01 Europ Propulsion Dispositif de stabilisation horizontale d'une masse a support inertiel vertical
FR2446955A1 (fr) * 1979-01-17 1980-08-14 Aerospatiale Systeme magnetique pour la stabilisation des corps tournants
DE2938749A1 (de) * 1979-09-25 1981-04-02 Siemens AG, 1000 Berlin und 8000 München Energiewandler
JPS56115653A (en) * 1980-02-19 1981-09-10 Toyota Motor Corp Rotary atomized electrostatic coating device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56125984A (en) * 1980-03-10 1981-10-02 Nippon Telegr & Teleph Corp <Ntt> Magnetically floating movable base

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08203800A (ja) * 1995-01-23 1996-08-09 Toshiba Mach Co Ltd 試料ホルダの固定装置
JP2001332181A (ja) * 2000-03-16 2001-11-30 Applied Materials Inc イオン抽出アセンブリ
JP2001308161A (ja) * 2000-04-25 2001-11-02 Kyocera Corp 真空用ステ−ジ機構
JP2007310302A (ja) * 2006-05-22 2007-11-29 Pentax Corp 移動ユニット支持装置

Also Published As

Publication number Publication date
EP0107414A3 (en) 1984-06-27
EP0107414A2 (en) 1984-05-02
EP0107414B1 (en) 1987-04-15
US4684315A (en) 1987-08-04
DE3371011D1 (en) 1987-05-21
JPH0328814B2 (OSRAM) 1991-04-22

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