JPS5958938U

JPS5958938U - Low pressure processing equipment

Info

Publication number: JPS5958938U
Application number: JP15406482U
Authority: JP
Inventors: 諭中山; 秀明竹内; 室田　淳一; 安田　和光
Original assignee: 日本電信電話株式会社
Priority date: 1982-10-13
Filing date: 1982-10-13
Publication date: 1984-04-17

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Brief explanation of drawings]

第１図は従来装置の概略構成図、第２図は本考案による
低圧処理装置の概略構成図である。１・・・処理室、２・・・予備室、３ａ、　　３ｂ・・
・ゲートバルブ、４ａ、　　４ｂ・・・ポンプ、５・・
・半導体基板支持台、６・・・リーク弁、７ａ、　’７
ｂ・・・半導体基板、８・・・主排気口、９・・・主排
気管、１０・・・副排気口、１１・・・副排気管、１２
・・・主排気口開閉バルブ、１３・・・流量制御装置、
１４・・・ガス導入口、１５・・・導入管。FIG. 1 is a schematic diagram of a conventional apparatus, and FIG. 2 is a schematic diagram of a low-pressure processing apparatus according to the present invention. 1...Processing room, 2...Preliminary room, 3a, 3b...
・Gate valve, 4a, 4b...Pump, 5...
・Semiconductor substrate support stand, 6... Leak valve, 7a, '7
b...Semiconductor substrate, 8...Main exhaust port, 9...Main exhaust pipe, 10...Subexhaust port, 11...Subexhaust pipe, 12
...Main exhaust port opening/closing valve, 13...Flow rate control device,
14...Gas inlet port, 15...Introduction pipe.

Claims

[Scope of utility model registration request]

In a low-pressure processing device that has a pre-chamber adjacent to a processing chamber for taking objects to be processed into and out of a processing chamber that is constantly maintained under low pressure, a main exhaust port for exhausting the inside of the pre-chamber into the pre-chamber. In addition, a sub-exhaust port with a smaller diameter than the main exhaust port is provided, and the sub-exhaust pipe is branched from the main exhaust pipe that communicates with the pump and the main exhaust port to communicate with the sub-exhaust port, and the main exhaust pipe is connected to the main exhaust pipe. A main exhaust port opening/closing valve is provided between the branch point and the main exhaust port, while the inlet pipe communicating with the gas inlet to the preliminary chamber has a continuous flow rate from zero to a constant flow rate. A low-pressure processing device characterized by being equipped with a flow rate control device that automatically increases the flow rate.