JPS59100855U - Continuous sputtering device - Google Patents

Continuous sputtering device

Info

Publication number
JPS59100855U
JPS59100855U JP19663982U JP19663982U JPS59100855U JP S59100855 U JPS59100855 U JP S59100855U JP 19663982 U JP19663982 U JP 19663982U JP 19663982 U JP19663982 U JP 19663982U JP S59100855 U JPS59100855 U JP S59100855U
Authority
JP
Japan
Prior art keywords
chamber
continuous sputtering
gas introduction
main gas
piping system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19663982U
Other languages
Japanese (ja)
Other versions
JPS6321573Y2 (en
Inventor
川上 伸男
Original Assignee
株式会社島津製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社島津製作所 filed Critical 株式会社島津製作所
Priority to JP19663982U priority Critical patent/JPS59100855U/en
Publication of JPS59100855U publication Critical patent/JPS59100855U/en
Application granted granted Critical
Publication of JPS6321573Y2 publication Critical patent/JPS6321573Y2/ja
Granted legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

図C1本考案の一実施例を示す正面図である。 、A・・・スパッタ装置、1・・・入口室、2・・・ス
パッタ室、3・・・出口室、4a、 4b、  4C,
4’d−・・仕切弁、5・・・主ガス導入管系、6・・
・バイパス管系、7・・・排・気管系。
Figure C1 is a front view showing an embodiment of the present invention. , A... Sputtering apparatus, 1... Inlet chamber, 2... Sputtering chamber, 3... Outlet chamber, 4a, 4b, 4C,
4'd-...Gate valve, 5...Main gas introduction pipe system, 6...
・Bypass pipe system, 7... Exhaust/tracheal system.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 入口室、スパッタ室および出口室が互いに仕切弁を介し
て直列に接続され、前記スパッタ室に主”ガス導入管系
が接続された連続スパッタ装置において、前記主ガス導
入管系に対しバイパス管系が接続され、該バイパス管系
のガス流量は前記主ガス導入管系のそれよりも大きく定
められたことを特徴とする連続スパッタ装置。
In a continuous sputtering apparatus in which an inlet chamber, a sputtering chamber, and an outlet chamber are connected to each other in series via a gate valve, and a main gas introduction piping system is connected to the sputtering chamber, a bypass piping system is connected to the main gas introduction piping system. A continuous sputtering apparatus characterized in that a gas flow rate of the bypass pipe system is set to be larger than that of the main gas introduction pipe system.
JP19663982U 1982-12-24 1982-12-24 Continuous sputtering device Granted JPS59100855U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19663982U JPS59100855U (en) 1982-12-24 1982-12-24 Continuous sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19663982U JPS59100855U (en) 1982-12-24 1982-12-24 Continuous sputtering device

Publications (2)

Publication Number Publication Date
JPS59100855U true JPS59100855U (en) 1984-07-07
JPS6321573Y2 JPS6321573Y2 (en) 1988-06-14

Family

ID=30421766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19663982U Granted JPS59100855U (en) 1982-12-24 1982-12-24 Continuous sputtering device

Country Status (1)

Country Link
JP (1) JPS59100855U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933155U (en) * 1972-06-27 1974-03-23
JPS56130470A (en) * 1980-03-14 1981-10-13 Hitachi Ltd Sputtering apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933155U (en) * 1972-06-27 1974-03-23
JPS56130470A (en) * 1980-03-14 1981-10-13 Hitachi Ltd Sputtering apparatus

Also Published As

Publication number Publication date
JPS6321573Y2 (en) 1988-06-14

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