JPS60155163U - vacuum equipment - Google Patents

vacuum equipment

Info

Publication number
JPS60155163U
JPS60155163U JP4306284U JP4306284U JPS60155163U JP S60155163 U JPS60155163 U JP S60155163U JP 4306284 U JP4306284 U JP 4306284U JP 4306284 U JP4306284 U JP 4306284U JP S60155163 U JPS60155163 U JP S60155163U
Authority
JP
Japan
Prior art keywords
vacuum
nitrogen gas
valve
leak
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4306284U
Other languages
Japanese (ja)
Inventor
洋一 渋木
河西　享
Original Assignee
日本電子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電子株式会社 filed Critical 日本電子株式会社
Priority to JP4306284U priority Critical patent/JPS60155163U/en
Publication of JPS60155163U publication Critical patent/JPS60155163U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来の真空装置の例を示す概略図、第２図は本
考案の一実施例を示す概略図である′。 １：、試料室、２：鏡筒、３：電子銃室、４：試料交換
室、５，６：仕切り弁、７：真空ポンプ、１２：高圧窒
素ガスボンベ、１３，１４，１５：配管、１６．１７．
１８：リーク弁、２，２：主リーク弁、２３：、安全弁
。 ′−−FIG. 1 is a schematic diagram showing an example of a conventional vacuum apparatus, and FIG. 2 is a schematic diagram showing an embodiment of the present invention. 1: sample chamber, 2: lens barrel, 3: electron gun chamber, 4: sample exchange chamber, 5, 6: gate valve, 7: vacuum pump, 12: high pressure nitrogen gas cylinder, 13, 14, 15: piping, 16 .17.
18: Leak valve, 2, 2: Main leak valve, 23: Safety valve. ′--

Claims (1)

【実用新案登録請求の範囲】 複数個の真空室を有し、各真空室を排気する手段を備え
た装置において１．単一の窒素ガス供給源と前記各真空
室とを配管及びリー多弁を介して接続しミ該各真空室を
単独に窒素ガスによりリーク可能に構成すると共に、前
記窒素ガス供給源と各真空室のリーク弁とを結ぶ配管の
適所に少なくとも１個の安定弁を設けてなる真空装置。 　。[Claims for Utility Model Registration] In an apparatus having a plurality of vacuum chambers and equipped with means for evacuating each vacuum chamber, 1. A single nitrogen gas supply source and each of the vacuum chambers are connected via piping and a multiplex valve so that each vacuum chamber can be independently leaked with nitrogen gas, and the nitrogen gas supply source and each vacuum chamber are configured to be able to leak independently. A vacuum device comprising at least one stabilizing valve installed at an appropriate location in a pipe connecting the leak valve and the leak valve. .
JP4306284U 1984-03-26 1984-03-26 vacuum equipment Pending JPS60155163U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4306284U JPS60155163U (en) 1984-03-26 1984-03-26 vacuum equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4306284U JPS60155163U (en) 1984-03-26 1984-03-26 vacuum equipment

Publications (1)

Publication Number Publication Date
JPS60155163U true JPS60155163U (en) 1985-10-16

Family

ID=30554383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4306284U Pending JPS60155163U (en) 1984-03-26 1984-03-26 vacuum equipment

Country Status (1)

Country Link
JP (1) JPS60155163U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015138639A (en) * 2014-01-22 2015-07-30 住友重機械工業株式会社 Negative ion source device, and method for replacement of plasma generating part in negative ion source device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015138639A (en) * 2014-01-22 2015-07-30 住友重機械工業株式会社 Negative ion source device, and method for replacement of plasma generating part in negative ion source device

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