JPS60133627U - gas gathering device - Google Patents

gas gathering device

Info

Publication number
JPS60133627U
JPS60133627U JP2088884U JP2088884U JPS60133627U JP S60133627 U JPS60133627 U JP S60133627U JP 2088884 U JP2088884 U JP 2088884U JP 2088884 U JP2088884 U JP 2088884U JP S60133627 U JPS60133627 U JP S60133627U
Authority
JP
Japan
Prior art keywords
gas
pressure
reducing valve
pressure reducing
cylinders
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2088884U
Other languages
Japanese (ja)
Inventor
菅野 昌吉
Original Assignee
日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電気株式会社 filed Critical 日本電気株式会社
Priority to JP2088884U priority Critical patent/JPS60133627U/en
Publication of JPS60133627U publication Critical patent/JPS60133627U/en
Pending legal-status Critical Current

Links

Landscapes

  • Pipeline Systems (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来装置の配管図、第2図は本考案の一丙施例
を示す配管図である。           。 1、 5. 7・・・ガスボンベ、4. 4’・・・減
圧弁。
FIG. 1 is a piping diagram of a conventional device, and FIG. 2 is a piping diagram showing one embodiment of the present invention. . 1, 5. 7... Gas cylinder, 4. 4'...Reducing valve.

Claims (1)

【実用新案登録請求の範囲】 力ゝスボンベより半導体ウェハーの膜形成に使用するガ
スを該ガスボンベのガス送出管路に設けた減圧弁で減圧
して供給するガス集合装置において、前記ガスボンベと
同圧のパージ用不活性ガス−ボンベを2本設け、両年活
性ガスボンベを前記ガス供給用減圧弁の一次側に並列に
接続し、かつ一方のパージ用不活性ガ′スボンベの管蕗
にリーク縛−。 鉄用減圧弁を設けたことを特徴とするガス集合装置。 
             −
[Scope of Claim for Utility Model Registration] In a gas collection device that supplies gas used for film formation on semiconductor wafers from a power gas cylinder after reducing the pressure with a pressure reducing valve installed in the gas delivery line of the gas cylinder, the pressure is the same as that of the gas cylinder. Two inert gas cylinders for purging are installed, and both active gas cylinders are connected in parallel to the primary side of the pressure reducing valve for gas supply, and leakage is prevented from occurring at the tube flap of one of the inert gas cylinders for purging. . A gas collecting device characterized by being equipped with a pressure reducing valve for iron.
JP2088884U 1984-02-16 1984-02-16 gas gathering device Pending JPS60133627U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2088884U JPS60133627U (en) 1984-02-16 1984-02-16 gas gathering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2088884U JPS60133627U (en) 1984-02-16 1984-02-16 gas gathering device

Publications (1)

Publication Number Publication Date
JPS60133627U true JPS60133627U (en) 1985-09-06

Family

ID=30511785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2088884U Pending JPS60133627U (en) 1984-02-16 1984-02-16 gas gathering device

Country Status (1)

Country Link
JP (1) JPS60133627U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63116000A (en) * 1986-10-30 1988-05-20 Mitsubishi Electric Corp High-pressure gas cylinder piping system for manufacturing semiconductor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63116000A (en) * 1986-10-30 1988-05-20 Mitsubishi Electric Corp High-pressure gas cylinder piping system for manufacturing semiconductor

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