JPS5958825A - 測長誤差を少なくする機能を備えた移動装置 - Google Patents

測長誤差を少なくする機能を備えた移動装置

Info

Publication number
JPS5958825A
JPS5958825A JP57168314A JP16831482A JPS5958825A JP S5958825 A JPS5958825 A JP S5958825A JP 57168314 A JP57168314 A JP 57168314A JP 16831482 A JP16831482 A JP 16831482A JP S5958825 A JPS5958825 A JP S5958825A
Authority
JP
Japan
Prior art keywords
base
stage
mask
chuck
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57168314A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0244365B2 (enrdf_load_stackoverflow
Inventor
Mineo Nomoto
峰生 野本
Susumu Aiuchi
進 相内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57168314A priority Critical patent/JPS5958825A/ja
Publication of JPS5958825A publication Critical patent/JPS5958825A/ja
Publication of JPH0244365B2 publication Critical patent/JPH0244365B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP57168314A 1982-09-29 1982-09-29 測長誤差を少なくする機能を備えた移動装置 Granted JPS5958825A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57168314A JPS5958825A (ja) 1982-09-29 1982-09-29 測長誤差を少なくする機能を備えた移動装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57168314A JPS5958825A (ja) 1982-09-29 1982-09-29 測長誤差を少なくする機能を備えた移動装置

Publications (2)

Publication Number Publication Date
JPS5958825A true JPS5958825A (ja) 1984-04-04
JPH0244365B2 JPH0244365B2 (enrdf_load_stackoverflow) 1990-10-03

Family

ID=15865731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57168314A Granted JPS5958825A (ja) 1982-09-29 1982-09-29 測長誤差を少なくする機能を備えた移動装置

Country Status (1)

Country Link
JP (1) JPS5958825A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62151783A (ja) * 1985-12-26 1987-07-06 東芝機械株式会社 高精度移動テ−ブル装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56107106A (en) * 1980-01-31 1981-08-25 Nec Corp Precision position-measuring device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56107106A (en) * 1980-01-31 1981-08-25 Nec Corp Precision position-measuring device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62151783A (ja) * 1985-12-26 1987-07-06 東芝機械株式会社 高精度移動テ−ブル装置

Also Published As

Publication number Publication date
JPH0244365B2 (enrdf_load_stackoverflow) 1990-10-03

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