JPH0244365B2 - - Google Patents
Info
- Publication number
- JPH0244365B2 JPH0244365B2 JP57168314A JP16831482A JPH0244365B2 JP H0244365 B2 JPH0244365 B2 JP H0244365B2 JP 57168314 A JP57168314 A JP 57168314A JP 16831482 A JP16831482 A JP 16831482A JP H0244365 B2 JPH0244365 B2 JP H0244365B2
- Authority
- JP
- Japan
- Prior art keywords
- stage
- photomask
- measured
- mounting table
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57168314A JPS5958825A (ja) | 1982-09-29 | 1982-09-29 | 測長誤差を少なくする機能を備えた移動装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57168314A JPS5958825A (ja) | 1982-09-29 | 1982-09-29 | 測長誤差を少なくする機能を備えた移動装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5958825A JPS5958825A (ja) | 1984-04-04 |
| JPH0244365B2 true JPH0244365B2 (enrdf_load_stackoverflow) | 1990-10-03 |
Family
ID=15865731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57168314A Granted JPS5958825A (ja) | 1982-09-29 | 1982-09-29 | 測長誤差を少なくする機能を備えた移動装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5958825A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62151783A (ja) * | 1985-12-26 | 1987-07-06 | 東芝機械株式会社 | 高精度移動テ−ブル装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56107106A (en) * | 1980-01-31 | 1981-08-25 | Nec Corp | Precision position-measuring device |
-
1982
- 1982-09-29 JP JP57168314A patent/JPS5958825A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5958825A (ja) | 1984-04-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5117255A (en) | Projection exposure apparatus | |
| US5179863A (en) | Method and apparatus for setting the gap distance between a mask and a wafer at a predetermined distance | |
| KR940003918B1 (ko) | 형상측정장치 | |
| US3786332A (en) | Micro positioning apparatus | |
| TW528881B (en) | Position measuring apparatus | |
| JP2000049066A (ja) | 露光装置およびデバイス製造方法 | |
| JP4050459B2 (ja) | ２つの対象物の位置を検出するための装置 | |
| JPH0257333B2 (enrdf_load_stackoverflow) | ||
| JPH0814484B2 (ja) | パタ−ン位置測定装置 | |
| JP2025500158A (ja) | 基板を位置合わせするための方法および装置 | |
| US11442427B2 (en) | Multiaxis machining device and compensation method thereof | |
| JP4500736B2 (ja) | 形状測定装置 | |
| US6351313B1 (en) | Device for detecting the position of two bodies | |
| US4425537A (en) | X-Y Addressable workpiece positioner and mask aligner using same | |
| JPH09223650A (ja) | 露光装置 | |
| JPH0587544A (ja) | 欠陥検査装置 | |
| US6172757B1 (en) | Lever sensor for stepper field-by-field focus and leveling system | |
| JPH0244365B2 (enrdf_load_stackoverflow) | ||
| JPH04317Y2 (enrdf_load_stackoverflow) | ||
| JPS62150106A (ja) | 位置検出装置 | |
| JPH06260393A (ja) | 位置決め装置 | |
| JP2586633Y2 (ja) | 平面度測定機 | |
| JPH085767A (ja) | 駆動テーブル | |
| JP2002228411A (ja) | 二次元測定装置 | |
| JPH09199573A (ja) | 位置決めステージ装置およびこれを用いた露光装置 |