JPS5943875A - 蒸発源及びその使用方法 - Google Patents
蒸発源及びその使用方法Info
- Publication number
- JPS5943875A JPS5943875A JP15424182A JP15424182A JPS5943875A JP S5943875 A JPS5943875 A JP S5943875A JP 15424182 A JP15424182 A JP 15424182A JP 15424182 A JP15424182 A JP 15424182A JP S5943875 A JPS5943875 A JP S5943875A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- source
- temperature
- evaporated
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001704 evaporation Methods 0.000 title claims abstract description 117
- 230000008020 evaporation Effects 0.000 title claims abstract description 116
- 238000000034 method Methods 0.000 title claims description 17
- 239000000463 material Substances 0.000 claims abstract description 56
- 238000005192 partition Methods 0.000 claims abstract description 13
- 238000001514 detection method Methods 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 6
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical class [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 6
- 229910001370 Se alloy Inorganic materials 0.000 claims description 5
- 230000002265 prevention Effects 0.000 claims description 5
- 229910052711 selenium Inorganic materials 0.000 claims description 4
- 239000011669 selenium Substances 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims 2
- 238000007740 vapor deposition Methods 0.000 abstract description 8
- 238000009833 condensation Methods 0.000 abstract description 2
- 230000005494 condensation Effects 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 229910018110 Se—Te Inorganic materials 0.000 abstract 1
- 229910052714 tellurium Inorganic materials 0.000 description 9
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 9
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 108091008695 photoreceptors Proteins 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 4
- 229910001215 Te alloy Inorganic materials 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15424182A JPS5943875A (ja) | 1982-09-04 | 1982-09-04 | 蒸発源及びその使用方法 |
| US06/528,215 US4551303A (en) | 1982-09-04 | 1983-08-31 | Method of using an evaporation source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15424182A JPS5943875A (ja) | 1982-09-04 | 1982-09-04 | 蒸発源及びその使用方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5943875A true JPS5943875A (ja) | 1984-03-12 |
| JPH0260754B2 JPH0260754B2 (enrdf_load_stackoverflow) | 1990-12-18 |
Family
ID=15579918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15424182A Granted JPS5943875A (ja) | 1982-09-04 | 1982-09-04 | 蒸発源及びその使用方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5943875A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6115970A (ja) * | 1984-07-02 | 1986-01-24 | Matsushita Electric Ind Co Ltd | 蒸着装置 |
| JPH01129961A (ja) * | 1987-11-16 | 1989-05-23 | Sumitomo Electric Ind Ltd | ダイヤモンドヒートシンクの製造法 |
| JPH0189953U (enrdf_load_stackoverflow) * | 1987-12-07 | 1989-06-13 |
-
1982
- 1982-09-04 JP JP15424182A patent/JPS5943875A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6115970A (ja) * | 1984-07-02 | 1986-01-24 | Matsushita Electric Ind Co Ltd | 蒸着装置 |
| JPH01129961A (ja) * | 1987-11-16 | 1989-05-23 | Sumitomo Electric Ind Ltd | ダイヤモンドヒートシンクの製造法 |
| JPH0189953U (enrdf_load_stackoverflow) * | 1987-12-07 | 1989-06-13 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0260754B2 (enrdf_load_stackoverflow) | 1990-12-18 |
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