JPS5941839A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS5941839A
JPS5941839A JP57151507A JP15150782A JPS5941839A JP S5941839 A JPS5941839 A JP S5941839A JP 57151507 A JP57151507 A JP 57151507A JP 15150782 A JP15150782 A JP 15150782A JP S5941839 A JPS5941839 A JP S5941839A
Authority
JP
Japan
Prior art keywords
pattern
forming
mask
insulating layer
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57151507A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0367335B2 (https=
Inventor
Mikio Segawa
幹雄 瀬川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57151507A priority Critical patent/JPS5941839A/ja
Publication of JPS5941839A publication Critical patent/JPS5941839A/ja
Publication of JPH0367335B2 publication Critical patent/JPH0367335B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57151507A 1982-08-31 1982-08-31 パタ−ン形成方法 Granted JPS5941839A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57151507A JPS5941839A (ja) 1982-08-31 1982-08-31 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57151507A JPS5941839A (ja) 1982-08-31 1982-08-31 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5941839A true JPS5941839A (ja) 1984-03-08
JPH0367335B2 JPH0367335B2 (https=) 1991-10-22

Family

ID=15520015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57151507A Granted JPS5941839A (ja) 1982-08-31 1982-08-31 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS5941839A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62194627A (ja) * 1986-02-20 1987-08-27 Fujitsu Ltd 半導体装置の製造方法
JP2005257712A (ja) * 2004-03-09 2005-09-22 Hoya Corp グレートーンマスク及びその製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5713180A (en) * 1980-06-25 1982-01-23 Fujitsu Ltd Etching method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5713180A (en) * 1980-06-25 1982-01-23 Fujitsu Ltd Etching method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62194627A (ja) * 1986-02-20 1987-08-27 Fujitsu Ltd 半導体装置の製造方法
JP2005257712A (ja) * 2004-03-09 2005-09-22 Hoya Corp グレートーンマスク及びその製造方法

Also Published As

Publication number Publication date
JPH0367335B2 (https=) 1991-10-22

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