JPS5933453A - レジスト塗布装置 - Google Patents

レジスト塗布装置

Info

Publication number
JPS5933453A
JPS5933453A JP14371782A JP14371782A JPS5933453A JP S5933453 A JPS5933453 A JP S5933453A JP 14371782 A JP14371782 A JP 14371782A JP 14371782 A JP14371782 A JP 14371782A JP S5933453 A JPS5933453 A JP S5933453A
Authority
JP
Japan
Prior art keywords
resist
cup
semiconductor wafer
prevent
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14371782A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0250614B2 (enrdf_load_stackoverflow
Inventor
Masanori Sato
正憲 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14371782A priority Critical patent/JPS5933453A/ja
Publication of JPS5933453A publication Critical patent/JPS5933453A/ja
Publication of JPH0250614B2 publication Critical patent/JPH0250614B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
JP14371782A 1982-08-19 1982-08-19 レジスト塗布装置 Granted JPS5933453A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14371782A JPS5933453A (ja) 1982-08-19 1982-08-19 レジスト塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14371782A JPS5933453A (ja) 1982-08-19 1982-08-19 レジスト塗布装置

Publications (2)

Publication Number Publication Date
JPS5933453A true JPS5933453A (ja) 1984-02-23
JPH0250614B2 JPH0250614B2 (enrdf_load_stackoverflow) 1990-11-02

Family

ID=15345344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14371782A Granted JPS5933453A (ja) 1982-08-19 1982-08-19 レジスト塗布装置

Country Status (1)

Country Link
JP (1) JPS5933453A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07195023A (ja) * 1995-01-30 1995-08-01 Tokyo Electron Ltd 塗布装置
JPH07195024A (ja) * 1995-01-30 1995-08-01 Tokyo Electron Ltd 塗布方法及びそれに用いる塗布装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5412670A (en) * 1977-06-30 1979-01-30 Matsushita Electric Ind Co Ltd Viscous agnent coating device
JPS54158568U (enrdf_load_stackoverflow) * 1978-04-26 1979-11-05
JPS5787862A (en) * 1980-11-19 1982-06-01 Toshiba Corp Rotary coating device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5412670A (en) * 1977-06-30 1979-01-30 Matsushita Electric Ind Co Ltd Viscous agnent coating device
JPS54158568U (enrdf_load_stackoverflow) * 1978-04-26 1979-11-05
JPS5787862A (en) * 1980-11-19 1982-06-01 Toshiba Corp Rotary coating device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07195023A (ja) * 1995-01-30 1995-08-01 Tokyo Electron Ltd 塗布装置
JPH07195024A (ja) * 1995-01-30 1995-08-01 Tokyo Electron Ltd 塗布方法及びそれに用いる塗布装置

Also Published As

Publication number Publication date
JPH0250614B2 (enrdf_load_stackoverflow) 1990-11-02

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