JPS5931542A - 液体金属イオン源 - Google Patents

液体金属イオン源

Info

Publication number
JPS5931542A
JPS5931542A JP57141129A JP14112982A JPS5931542A JP S5931542 A JPS5931542 A JP S5931542A JP 57141129 A JP57141129 A JP 57141129A JP 14112982 A JP14112982 A JP 14112982A JP S5931542 A JPS5931542 A JP S5931542A
Authority
JP
Japan
Prior art keywords
tip
ion source
liquid metal
needle
silicon carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57141129A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0349175B2 (enrdf_load_stackoverflow
Inventor
Toru Ishitani
亨 石谷
Shigeyuki Hosoki
茂行 細木
Hifumi Tamura
田村 一二三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57141129A priority Critical patent/JPS5931542A/ja
Publication of JPS5931542A publication Critical patent/JPS5931542A/ja
Publication of JPH0349175B2 publication Critical patent/JPH0349175B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/26Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
JP57141129A 1982-08-16 1982-08-16 液体金属イオン源 Granted JPS5931542A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57141129A JPS5931542A (ja) 1982-08-16 1982-08-16 液体金属イオン源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57141129A JPS5931542A (ja) 1982-08-16 1982-08-16 液体金属イオン源

Publications (2)

Publication Number Publication Date
JPS5931542A true JPS5931542A (ja) 1984-02-20
JPH0349175B2 JPH0349175B2 (enrdf_load_stackoverflow) 1991-07-26

Family

ID=15284834

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57141129A Granted JPS5931542A (ja) 1982-08-16 1982-08-16 液体金属イオン源

Country Status (1)

Country Link
JP (1) JPS5931542A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4638209A (en) * 1983-09-08 1987-01-20 Anelva Corporation Ion beam generating apparatus
JPH04101537U (ja) * 1991-02-08 1992-09-02 旭光学工業株式会社 カメラのフアインダ−構造
US8058381B2 (en) 2009-03-12 2011-11-15 Shin-Etsu Chemical Co., Ltd. Liquid curable fluorosilicone composition and production method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4638209A (en) * 1983-09-08 1987-01-20 Anelva Corporation Ion beam generating apparatus
JPH04101537U (ja) * 1991-02-08 1992-09-02 旭光学工業株式会社 カメラのフアインダ−構造
US8058381B2 (en) 2009-03-12 2011-11-15 Shin-Etsu Chemical Co., Ltd. Liquid curable fluorosilicone composition and production method thereof

Also Published As

Publication number Publication date
JPH0349175B2 (enrdf_load_stackoverflow) 1991-07-26

Similar Documents

Publication Publication Date Title
JPS62139227A (ja) 液体金属イオン源
JPS61142645A (ja) 正,負兼用イオン源
JPS5931542A (ja) 液体金属イオン源
US4624833A (en) Liquid metal ion source and apparatus
GB462500A (en) Improvements in and relating to electric discharge devices
JPH026184B2 (enrdf_load_stackoverflow)
JPH0582041A (ja) 液体金属イオン源
JPS61101938A (ja) 液体金属イオン源
JP2688261B2 (ja) 電界放出型イオン源
JPS5842149A (ja) セシウムイオン源
JPS59191225A (ja) 液体金属イオン種合金
JPS58198822A (ja) 液体金属イオン源
TWI293788B (en) Ion gun
JPH1064438A (ja) 液体金属イオン源
JPH1154086A (ja) タングステン系電極材及びその製法
JPS5830055A (ja) イオンビ−ム源
JPS617535A (ja) 液体金属イオン源
JPS58158838A (ja) 液体金属イオン源
JPS60249225A (ja) 液体金属イオン源
JPS59160941A (ja) イオン源
CN115662860A (zh) 一种微焦点x射线源阴极结构及其制备方法
RU2034356C1 (ru) Источник ионов
JPS58137943A (ja) イオン源
JPS60216432A (ja) イオンビーム形成方法および液体金属イオン源
JPS5933737A (ja) 液体金属イオン源