JPS5927499A - 簡単で高能率なシ−トプラズマの生成法 - Google Patents

簡単で高能率なシ−トプラズマの生成法

Info

Publication number
JPS5927499A
JPS5927499A JP57060634A JP6063482A JPS5927499A JP S5927499 A JPS5927499 A JP S5927499A JP 57060634 A JP57060634 A JP 57060634A JP 6063482 A JP6063482 A JP 6063482A JP S5927499 A JPS5927499 A JP S5927499A
Authority
JP
Japan
Prior art keywords
plasma
sheet plasma
highly efficient
sheet
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57060634A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0423400B2 (enrdf_load_stackoverflow
Inventor
上進 浦本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP57060634A priority Critical patent/JPS5927499A/ja
Publication of JPS5927499A publication Critical patent/JPS5927499A/ja
Publication of JPH0423400B2 publication Critical patent/JPH0423400B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Plasma Technology (AREA)
JP57060634A 1982-04-12 1982-04-12 簡単で高能率なシ−トプラズマの生成法 Granted JPS5927499A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57060634A JPS5927499A (ja) 1982-04-12 1982-04-12 簡単で高能率なシ−トプラズマの生成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57060634A JPS5927499A (ja) 1982-04-12 1982-04-12 簡単で高能率なシ−トプラズマの生成法

Publications (2)

Publication Number Publication Date
JPS5927499A true JPS5927499A (ja) 1984-02-13
JPH0423400B2 JPH0423400B2 (enrdf_load_stackoverflow) 1992-04-22

Family

ID=13147936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57060634A Granted JPS5927499A (ja) 1982-04-12 1982-04-12 簡単で高能率なシ−トプラズマの生成法

Country Status (1)

Country Link
JP (1) JPS5927499A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6350464A (ja) * 1986-08-19 1988-03-03 Toobi:Kk シ−トプラズマ・イオンプレ−テイング方法とその装置
US5123227A (en) * 1988-04-21 1992-06-23 Snow Brand Milk Products Co., Ltd. Positioning and press-sealing means
JPH04289164A (ja) * 1991-03-19 1992-10-14 Limes:Kk イオンプレーティングによる成膜方法
US5413663A (en) * 1992-06-11 1995-05-09 Tokyo Electron Limited Plasma processing apparatus
US5601653A (en) * 1993-04-30 1997-02-11 Kabushiki Kaisha Toshiba Apparatus for performing plasma process on semiconductor wafers and the like and method of performing plasma process
WO2008120430A1 (ja) * 2007-03-28 2008-10-09 Shinmaywa Industries, Ltd. シートプラズマ装置及びシート状プラズマ調整方法
WO2008136130A1 (ja) * 2007-04-24 2008-11-13 Canon Anelva Corporation プラズマ発生装置およびこれを用いた成膜方法並びに成膜装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4906331B2 (ja) * 2005-12-06 2012-03-28 新明和工業株式会社 シートプラズマ成膜装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MACHINE.DESIGN.VOL.51.N09.P30-36=1979 *

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6350464A (ja) * 1986-08-19 1988-03-03 Toobi:Kk シ−トプラズマ・イオンプレ−テイング方法とその装置
US5123227A (en) * 1988-04-21 1992-06-23 Snow Brand Milk Products Co., Ltd. Positioning and press-sealing means
US5157895A (en) * 1988-04-21 1992-10-27 Snow Brand Milk Products, Ltd. Positioning and press-sealing means
JPH04289164A (ja) * 1991-03-19 1992-10-14 Limes:Kk イオンプレーティングによる成膜方法
US5413663A (en) * 1992-06-11 1995-05-09 Tokyo Electron Limited Plasma processing apparatus
US5601653A (en) * 1993-04-30 1997-02-11 Kabushiki Kaisha Toshiba Apparatus for performing plasma process on semiconductor wafers and the like and method of performing plasma process
WO2008120430A1 (ja) * 2007-03-28 2008-10-09 Shinmaywa Industries, Ltd. シートプラズマ装置及びシート状プラズマ調整方法
JP5261179B2 (ja) * 2007-03-28 2013-08-14 新明和工業株式会社 シートプラズマ装置及びシート状プラズマ調整方法
WO2008136130A1 (ja) * 2007-04-24 2008-11-13 Canon Anelva Corporation プラズマ発生装置およびこれを用いた成膜方法並びに成膜装置

Also Published As

Publication number Publication date
JPH0423400B2 (enrdf_load_stackoverflow) 1992-04-22

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