JPS59232433A - ワ−ク受渡し装置 - Google Patents

ワ−ク受渡し装置

Info

Publication number
JPS59232433A
JPS59232433A JP58106778A JP10677883A JPS59232433A JP S59232433 A JPS59232433 A JP S59232433A JP 58106778 A JP58106778 A JP 58106778A JP 10677883 A JP10677883 A JP 10677883A JP S59232433 A JPS59232433 A JP S59232433A
Authority
JP
Japan
Prior art keywords
work
workpiece
ring
work holder
forward movement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58106778A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0547985B2 (enExample
Inventor
Takao Amasawa
天沢　敬生
Katsuo Ono
勝雄 大野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Nippon Telegraph and Telephone Corp
Priority to JP58106778A priority Critical patent/JPS59232433A/ja
Publication of JPS59232433A publication Critical patent/JPS59232433A/ja
Publication of JPH0547985B2 publication Critical patent/JPH0547985B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
JP58106778A 1983-06-16 1983-06-16 ワ−ク受渡し装置 Granted JPS59232433A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58106778A JPS59232433A (ja) 1983-06-16 1983-06-16 ワ−ク受渡し装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58106778A JPS59232433A (ja) 1983-06-16 1983-06-16 ワ−ク受渡し装置

Publications (2)

Publication Number Publication Date
JPS59232433A true JPS59232433A (ja) 1984-12-27
JPH0547985B2 JPH0547985B2 (enExample) 1993-07-20

Family

ID=14442359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58106778A Granted JPS59232433A (ja) 1983-06-16 1983-06-16 ワ−ク受渡し装置

Country Status (1)

Country Link
JP (1) JPS59232433A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63316444A (ja) * 1987-06-19 1988-12-23 Hitachi Electronics Eng Co Ltd 銀ペ−ストキュア装置における加熱装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63316444A (ja) * 1987-06-19 1988-12-23 Hitachi Electronics Eng Co Ltd 銀ペ−ストキュア装置における加熱装置

Also Published As

Publication number Publication date
JPH0547985B2 (enExample) 1993-07-20

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