JPS59221952A - 電子線装置における電子線の照射方法 - Google Patents
電子線装置における電子線の照射方法Info
- Publication number
- JPS59221952A JPS59221952A JP58094906A JP9490683A JPS59221952A JP S59221952 A JPS59221952 A JP S59221952A JP 58094906 A JP58094906 A JP 58094906A JP 9490683 A JP9490683 A JP 9490683A JP S59221952 A JPS59221952 A JP S59221952A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- lens
- focusing lens
- stage
- excitation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 89
- 238000000034 method Methods 0.000 title claims abstract description 20
- 230000001678 irradiating effect Effects 0.000 title abstract 2
- 230000005284 excitation Effects 0.000 claims abstract description 47
- 238000003384 imaging method Methods 0.000 claims description 8
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 9
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000004075 alteration Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000002003 electron diffraction Methods 0.000 description 2
- 238000012827 research and development Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58094906A JPS59221952A (ja) | 1983-05-31 | 1983-05-31 | 電子線装置における電子線の照射方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58094906A JPS59221952A (ja) | 1983-05-31 | 1983-05-31 | 電子線装置における電子線の照射方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59221952A true JPS59221952A (ja) | 1984-12-13 |
| JPH0161228B2 JPH0161228B2 (enrdf_load_stackoverflow) | 1989-12-27 |
Family
ID=14123056
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58094906A Granted JPS59221952A (ja) | 1983-05-31 | 1983-05-31 | 電子線装置における電子線の照射方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59221952A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63105451A (ja) * | 1986-10-14 | 1988-05-10 | トムソン−セーエスエフ | 照度と絞りの開口角が可変な電子光学装置およびこの装置を応用した電子ビームリソグラフィーシステム |
-
1983
- 1983-05-31 JP JP58094906A patent/JPS59221952A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63105451A (ja) * | 1986-10-14 | 1988-05-10 | トムソン−セーエスエフ | 照度と絞りの開口角が可変な電子光学装置およびこの装置を応用した電子ビームリソグラフィーシステム |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0161228B2 (enrdf_load_stackoverflow) | 1989-12-27 |
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