JPH0161228B2 - - Google Patents
Info
- Publication number
- JPH0161228B2 JPH0161228B2 JP58094906A JP9490683A JPH0161228B2 JP H0161228 B2 JPH0161228 B2 JP H0161228B2 JP 58094906 A JP58094906 A JP 58094906A JP 9490683 A JP9490683 A JP 9490683A JP H0161228 B2 JPH0161228 B2 JP H0161228B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- focusing lens
- stage
- lens
- objective lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 85
- 230000005284 excitation Effects 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 18
- 238000003384 imaging method Methods 0.000 claims description 9
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000004075 alteration Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 2
- 238000002003 electron diffraction Methods 0.000 description 2
- 238000012827 research and development Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58094906A JPS59221952A (ja) | 1983-05-31 | 1983-05-31 | 電子線装置における電子線の照射方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58094906A JPS59221952A (ja) | 1983-05-31 | 1983-05-31 | 電子線装置における電子線の照射方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59221952A JPS59221952A (ja) | 1984-12-13 |
JPH0161228B2 true JPH0161228B2 (enrdf_load_stackoverflow) | 1989-12-27 |
Family
ID=14123056
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58094906A Granted JPS59221952A (ja) | 1983-05-31 | 1983-05-31 | 電子線装置における電子線の照射方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59221952A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2605143B1 (fr) * | 1986-10-14 | 1994-04-29 | Thomson Csf | Dispositif d'optique electronique, d'illumination et de limitation d'ouverture variables, et son application a un systeme de lithographie par faisceau d'electrons |
-
1983
- 1983-05-31 JP JP58094906A patent/JPS59221952A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59221952A (ja) | 1984-12-13 |
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