JPS59213155A - 半導体集積回路装置 - Google Patents

半導体集積回路装置

Info

Publication number
JPS59213155A
JPS59213155A JP58087893A JP8789383A JPS59213155A JP S59213155 A JPS59213155 A JP S59213155A JP 58087893 A JP58087893 A JP 58087893A JP 8789383 A JP8789383 A JP 8789383A JP S59213155 A JPS59213155 A JP S59213155A
Authority
JP
Japan
Prior art keywords
diode
input
integrated circuit
semiconductor integrated
circuit device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58087893A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0348662B2 (enrdf_load_stackoverflow
Inventor
Masaya Iio
飯尾　雅也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP58087893A priority Critical patent/JPS59213155A/ja
Publication of JPS59213155A publication Critical patent/JPS59213155A/ja
Publication of JPH0348662B2 publication Critical patent/JPH0348662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]

Landscapes

  • Semiconductor Integrated Circuits (AREA)
JP58087893A 1983-05-17 1983-05-17 半導体集積回路装置 Granted JPS59213155A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58087893A JPS59213155A (ja) 1983-05-17 1983-05-17 半導体集積回路装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58087893A JPS59213155A (ja) 1983-05-17 1983-05-17 半導体集積回路装置

Publications (2)

Publication Number Publication Date
JPS59213155A true JPS59213155A (ja) 1984-12-03
JPH0348662B2 JPH0348662B2 (enrdf_load_stackoverflow) 1991-07-25

Family

ID=13927559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58087893A Granted JPS59213155A (ja) 1983-05-17 1983-05-17 半導体集積回路装置

Country Status (1)

Country Link
JP (1) JPS59213155A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015023177A (ja) * 2013-07-19 2015-02-02 富士通セミコンダクター株式会社 半導体装置
CN115356606A (zh) * 2022-08-03 2022-11-18 北京芯可鉴科技有限公司 隔离器件耐压测试的装置、制造方法及耐压测试的方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4975280A (enrdf_load_stackoverflow) * 1972-11-24 1974-07-19
JPS4982279A (enrdf_load_stackoverflow) * 1972-12-11 1974-08-08
JPS5879735A (ja) * 1981-11-06 1983-05-13 Nec Corp 半導体集積回路

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4975280A (enrdf_load_stackoverflow) * 1972-11-24 1974-07-19
JPS4982279A (enrdf_load_stackoverflow) * 1972-12-11 1974-08-08
JPS5879735A (ja) * 1981-11-06 1983-05-13 Nec Corp 半導体集積回路

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015023177A (ja) * 2013-07-19 2015-02-02 富士通セミコンダクター株式会社 半導体装置
CN115356606A (zh) * 2022-08-03 2022-11-18 北京芯可鉴科技有限公司 隔离器件耐压测试的装置、制造方法及耐压测试的方法

Also Published As

Publication number Publication date
JPH0348662B2 (enrdf_load_stackoverflow) 1991-07-25

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