JPS59210403A - 回折格子の作製法 - Google Patents

回折格子の作製法

Info

Publication number
JPS59210403A
JPS59210403A JP8368183A JP8368183A JPS59210403A JP S59210403 A JPS59210403 A JP S59210403A JP 8368183 A JP8368183 A JP 8368183A JP 8368183 A JP8368183 A JP 8368183A JP S59210403 A JPS59210403 A JP S59210403A
Authority
JP
Japan
Prior art keywords
diffraction grating
mask
substrate
photoresist
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8368183A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0456284B2 (cs
Inventor
Shigeo Toda
戸田　重郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP8368183A priority Critical patent/JPS59210403A/ja
Publication of JPS59210403A publication Critical patent/JPS59210403A/ja
Publication of JPH0456284B2 publication Critical patent/JPH0456284B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP8368183A 1983-05-13 1983-05-13 回折格子の作製法 Granted JPS59210403A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8368183A JPS59210403A (ja) 1983-05-13 1983-05-13 回折格子の作製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8368183A JPS59210403A (ja) 1983-05-13 1983-05-13 回折格子の作製法

Publications (2)

Publication Number Publication Date
JPS59210403A true JPS59210403A (ja) 1984-11-29
JPH0456284B2 JPH0456284B2 (cs) 1992-09-08

Family

ID=13809227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8368183A Granted JPS59210403A (ja) 1983-05-13 1983-05-13 回折格子の作製法

Country Status (1)

Country Link
JP (1) JPS59210403A (cs)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6343101A (ja) * 1986-08-08 1988-02-24 Toyo Commun Equip Co Ltd 透過型回折格子の製造方法
JPH01161302A (ja) * 1987-12-18 1989-06-26 Shimadzu Corp ホログラフィックグレーティング製作方法
CN1306286C (zh) * 2003-10-09 2007-03-21 国际商业机器公司 色散元件、衍射光栅和制造衍射光栅的方法
JP2018036324A (ja) * 2016-08-29 2018-03-08 凸版印刷株式会社 光学素子およびその製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6343101A (ja) * 1986-08-08 1988-02-24 Toyo Commun Equip Co Ltd 透過型回折格子の製造方法
JPH01161302A (ja) * 1987-12-18 1989-06-26 Shimadzu Corp ホログラフィックグレーティング製作方法
CN1306286C (zh) * 2003-10-09 2007-03-21 国际商业机器公司 色散元件、衍射光栅和制造衍射光栅的方法
JP2018036324A (ja) * 2016-08-29 2018-03-08 凸版印刷株式会社 光学素子およびその製造方法

Also Published As

Publication number Publication date
JPH0456284B2 (cs) 1992-09-08

Similar Documents

Publication Publication Date Title
EP0110184B1 (en) Process for fabricating integrated optics
EP2752691A1 (en) Variable-efficiency diffraction grating
GB2509536A (en) Diffraction grating
WO2014108670A1 (en) Diffraction gratings and the manufacture thereof
JP2001042114A (ja) 光学素子の製造方法
US4321282A (en) Surface gratings and a method of increasing their spatial frequency
JPS59210403A (ja) 回折格子の作製法
JP3029524B2 (ja) 回折格子の製造方法
GB2079536A (en) Process for producing an optical network
JPH1172606A (ja) ＳｉＣのパターンエッチング方法
JPS59116602A (ja) チヤ−プトグレ−テイングの製造方法
CA1269748A (en) Method of forming a variable width channel
JP2000105307A (ja) デジタルブレ−ズ回折格子の作製方法
JP2506967B2 (ja) 光ディスク原盤の製造方法
JPS63187202A (ja) ブレ−ズドホログラフイツク回折格子
JPS5947282B2 (ja) エシエレツト格子の製造方法
JPH04186829A (ja) 半導体装置の製造方法
JPH03238454A (ja) 干渉露光用マスクの製造方法
JP2942825B1 (ja) 面外分岐ミラーを有する光集積回路の製造方法
JP2003121619A (ja) 光学素子及びその製造方法
JP2711194B2 (ja) 露光装置
JP2507817B2 (ja) 回折素子の製造方法
JPH0620940A (ja) レジストパターン作製方法
JPH05343806A (ja) 位相シフト型回折格子の製造方法
JPS6218559A (ja) 露光用マスク