JPS5920468A - 蒸着方法 - Google Patents

蒸着方法

Info

Publication number
JPS5920468A
JPS5920468A JP57130822A JP13082282A JPS5920468A JP S5920468 A JPS5920468 A JP S5920468A JP 57130822 A JP57130822 A JP 57130822A JP 13082282 A JP13082282 A JP 13082282A JP S5920468 A JPS5920468 A JP S5920468A
Authority
JP
Japan
Prior art keywords
electron beam
vapor deposition
vessel
acceleration voltage
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57130822A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6147221B2 (enrdf_load_stackoverflow
Inventor
Koichi Shinohara
紘一 篠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57130822A priority Critical patent/JPS5920468A/ja
Publication of JPS5920468A publication Critical patent/JPS5920468A/ja
Publication of JPS6147221B2 publication Critical patent/JPS6147221B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
JP57130822A 1982-07-27 1982-07-27 蒸着方法 Granted JPS5920468A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57130822A JPS5920468A (ja) 1982-07-27 1982-07-27 蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57130822A JPS5920468A (ja) 1982-07-27 1982-07-27 蒸着方法

Publications (2)

Publication Number Publication Date
JPS5920468A true JPS5920468A (ja) 1984-02-02
JPS6147221B2 JPS6147221B2 (enrdf_load_stackoverflow) 1986-10-17

Family

ID=15043520

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57130822A Granted JPS5920468A (ja) 1982-07-27 1982-07-27 蒸着方法

Country Status (1)

Country Link
JP (1) JPS5920468A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0214424A (ja) * 1988-06-30 1990-01-18 Sony Corp 磁気記録媒体の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013100581A (ja) * 2011-11-09 2013-05-23 Ulvac Japan Ltd 蒸着装置及び蒸着方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0214424A (ja) * 1988-06-30 1990-01-18 Sony Corp 磁気記録媒体の製造方法

Also Published As

Publication number Publication date
JPS6147221B2 (enrdf_load_stackoverflow) 1986-10-17

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