JPS59202462A - ネガ型レジストのパタ−ン形成方法 - Google Patents

ネガ型レジストのパタ−ン形成方法

Info

Publication number
JPS59202462A
JPS59202462A JP58076203A JP7620383A JPS59202462A JP S59202462 A JPS59202462 A JP S59202462A JP 58076203 A JP58076203 A JP 58076203A JP 7620383 A JP7620383 A JP 7620383A JP S59202462 A JPS59202462 A JP S59202462A
Authority
JP
Japan
Prior art keywords
ultraviolet rays
resist pattern
irradiated
heating
seconds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58076203A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0334055B2 (cg-RX-API-DMAC10.html
Inventor
Yoshio Yamashita
山下　吉雄
Takaharu Kawazu
河津　隆治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58076203A priority Critical patent/JPS59202462A/ja
Priority to US06/594,481 priority patent/US4609615A/en
Priority to EP84302145A priority patent/EP0124265B1/en
Priority to DE8484302145T priority patent/DE3466741D1/de
Priority to CA000450963A priority patent/CA1214679A/en
Publication of JPS59202462A publication Critical patent/JPS59202462A/ja
Publication of JPH0334055B2 publication Critical patent/JPH0334055B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP58076203A 1983-03-31 1983-05-02 ネガ型レジストのパタ−ン形成方法 Granted JPS59202462A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58076203A JPS59202462A (ja) 1983-05-02 1983-05-02 ネガ型レジストのパタ−ン形成方法
US06/594,481 US4609615A (en) 1983-03-31 1984-03-27 Process for forming pattern with negative resist using quinone diazide compound
EP84302145A EP0124265B1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
DE8484302145T DE3466741D1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
CA000450963A CA1214679A (en) 1983-03-31 1984-03-30 Process for forming pattern with negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58076203A JPS59202462A (ja) 1983-05-02 1983-05-02 ネガ型レジストのパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS59202462A true JPS59202462A (ja) 1984-11-16
JPH0334055B2 JPH0334055B2 (cg-RX-API-DMAC10.html) 1991-05-21

Family

ID=13598596

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58076203A Granted JPS59202462A (ja) 1983-03-31 1983-05-02 ネガ型レジストのパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS59202462A (cg-RX-API-DMAC10.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6045243A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS61241745A (ja) * 1985-04-18 1986-10-28 Oki Electric Ind Co Ltd ネガ型フオトレジスト組成物及びレジストパタ−ン形成方法
JPS6238448A (ja) * 1985-08-12 1987-02-19 ヘキスト・セラニ−ズ・コ−ポレイシヨン ポジ型写真材料のネガチブ画像の製法
JPH01158451A (ja) * 1987-09-25 1989-06-21 Toray Ind Inc 水なし平版印刷板の製版方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127615A (cg-RX-API-DMAC10.html) * 1973-04-07 1974-12-06
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127615A (cg-RX-API-DMAC10.html) * 1973-04-07 1974-12-06
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6045243A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS61241745A (ja) * 1985-04-18 1986-10-28 Oki Electric Ind Co Ltd ネガ型フオトレジスト組成物及びレジストパタ−ン形成方法
JPS6238448A (ja) * 1985-08-12 1987-02-19 ヘキスト・セラニ−ズ・コ−ポレイシヨン ポジ型写真材料のネガチブ画像の製法
JPH01158451A (ja) * 1987-09-25 1989-06-21 Toray Ind Inc 水なし平版印刷板の製版方法

Also Published As

Publication number Publication date
JPH0334055B2 (cg-RX-API-DMAC10.html) 1991-05-21

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