JPS59198606A - 透明導電膜形成用組成物 - Google Patents

透明導電膜形成用組成物

Info

Publication number
JPS59198606A
JPS59198606A JP7292783A JP7292783A JPS59198606A JP S59198606 A JPS59198606 A JP S59198606A JP 7292783 A JP7292783 A JP 7292783A JP 7292783 A JP7292783 A JP 7292783A JP S59198606 A JPS59198606 A JP S59198606A
Authority
JP
Japan
Prior art keywords
composition
conductive film
organic solvent
transparent conductive
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7292783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0221083B2 (enrdf_load_stackoverflow
Inventor
中馬　明博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP7292783A priority Critical patent/JPS59198606A/ja
Publication of JPS59198606A publication Critical patent/JPS59198606A/ja
Publication of JPH0221083B2 publication Critical patent/JPH0221083B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Non-Insulated Conductors (AREA)
  • Paints Or Removers (AREA)
  • Conductive Materials (AREA)
JP7292783A 1983-04-27 1983-04-27 透明導電膜形成用組成物 Granted JPS59198606A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7292783A JPS59198606A (ja) 1983-04-27 1983-04-27 透明導電膜形成用組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7292783A JPS59198606A (ja) 1983-04-27 1983-04-27 透明導電膜形成用組成物

Publications (2)

Publication Number Publication Date
JPS59198606A true JPS59198606A (ja) 1984-11-10
JPH0221083B2 JPH0221083B2 (enrdf_load_stackoverflow) 1990-05-11

Family

ID=13503475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7292783A Granted JPS59198606A (ja) 1983-04-27 1983-04-27 透明導電膜形成用組成物

Country Status (1)

Country Link
JP (1) JPS59198606A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01115010A (ja) * 1987-10-28 1989-05-08 Central Glass Co Ltd 透明導電性膜用組成物およびその膜の形成方法
WO2011072887A1 (de) * 2009-12-18 2011-06-23 Evonik Degussa Gmbh Verfahren zur herstellung von indiumchlordialkoxiden
WO2011073005A2 (de) 2009-12-18 2011-06-23 Evonik Degussa Gmbh Verfahren zur herstellung von indiumoxid-haltigen schichten, nach dem verfahren hergestellte indiumoxid-haltige schichten und ihre verwendung
DE102010043668A1 (de) 2010-11-10 2012-05-10 Evonik Degussa Gmbh Verfahren zur Herstellung von Indiumoxid-haltigen Schichten, nach dem Verfahren hergestellte Indiumoxid-haltige Schichten und ihre Verwendung

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01115010A (ja) * 1987-10-28 1989-05-08 Central Glass Co Ltd 透明導電性膜用組成物およびその膜の形成方法
WO2011072887A1 (de) * 2009-12-18 2011-06-23 Evonik Degussa Gmbh Verfahren zur herstellung von indiumchlordialkoxiden
WO2011073005A2 (de) 2009-12-18 2011-06-23 Evonik Degussa Gmbh Verfahren zur herstellung von indiumoxid-haltigen schichten, nach dem verfahren hergestellte indiumoxid-haltige schichten und ihre verwendung
CN102652187A (zh) * 2009-12-18 2012-08-29 赢创德固赛有限公司 生产含氧化铟的层的方法，通过该方法生产的含氧化铟的层及其用途
CN102652137A (zh) * 2009-12-18 2012-08-29 赢创德固赛有限公司 制备铟氯二醇盐的方法
US8580989B2 (en) 2009-12-18 2013-11-12 Evonik Degussa Gmbh Process for the preparation of indium chlordialkoxides
CN102652137B (zh) * 2009-12-18 2015-12-02 赢创德固赛有限公司 制备铟氯二醇盐的方法
DE102010043668A1 (de) 2010-11-10 2012-05-10 Evonik Degussa Gmbh Verfahren zur Herstellung von Indiumoxid-haltigen Schichten, nach dem Verfahren hergestellte Indiumoxid-haltige Schichten und ihre Verwendung
WO2012062575A1 (de) 2010-11-10 2012-05-18 Evonik Degussa Gmbh Verfahren zur herstellung von indiumoxid-haltigen schichten
JP2013543931A (ja) * 2010-11-10 2013-12-09 エボニック デグサ ゲーエムベーハー 酸化インジウム含有層の製造方法
JP2016169150A (ja) * 2010-11-10 2016-09-23 エボニック デグサ ゲーエムベーハーＥｖｏｎｉｋ Ｄｅｇｕｓｓａ ＧｍｂＨ 酸化インジウム含有層の製造方法

Also Published As

Publication number Publication date
JPH0221083B2 (enrdf_load_stackoverflow) 1990-05-11

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